E.a. Fischione Instruments, Inc.

Other

Paul E Fischione

Joseph M Matesa, Jr

Pushkarraj Deshmukh

Jeffrey J Gronsky

David W Smith

Alan C Robins

Michael Ross Scheinfein

Thomas C Swihart, Iii

Christine M Thomas

Halina Stabacinskiene

David Martin

Michael F Boccabella

Rocco R Cerchiara

Jeff Gronsky

Joseph M Matesa

Junhai Liu

Pushkarraj V Deshmukh

A system and method for the precise and uniform material removal or delayering of a large area of a sample is provided. The size of the milled area is controllable, ranging from sub-millimeter to multi-millimeter scale and the depth resolution is controllable on the nanometer scale. A controlled singularly charged ion beam is scanned across the sample surface in such a manner to normalize the ion density distribution from the sample center toward the periphery to realize uniform delayering.

System and method for uniform ion milling

An apparatus for preparing a sample for microscopy is provided that has a milling device that removes material from a sample in order to thin the sample. An electron beam that is directed onto the sample is present along with a detector that detects when the electron beam has reached a preselected threshold transmitted through or immediately adjacent the sample. Once the detector detects the electron beam has reached this threshold, the milling device terminates the milling process.

Apparatus for preparing a sample for microscopy

An ion source is disclosed which utilizes independently powered electrodes that are isolated with a series of insulators. The ion source comprises an anode electrode with a hollow interior, where the anode is disposed between a cathode and an anti-cathode. A magnet or electro-magnet imposes a magnetic field in an axial direction through the bore of the anode. Gas is introduced into the anode area at a controllable pressure. The ion source includes a first voltage differential between the anode and cathode for the production of plasma and a second voltage differential between the anode and the anti-cathode for extraction of ions from the plasma, forming an ion beam, which is preferably of a narrow diameter at low beam energy. In particular, the voltage differential between the anti-cathode and anode is adjusted to control the initial beam divergence of extracted ions. An optional focus electrode with an independent power supply further focuses the ion beam. A final electrode defines the output boundary of the ion source to provide un-perturbed drift of the ions into the vacuum chamber.

Ion source with independent power supplies

An improved cryogenic specimen holder for imaging and analysis facilitates imaging at very high tilt angles with a large field of view. A retractable specimen holder tip protects the specimen during transport. An optimized Dewar design is positioned at a fixed, tilted angle with respect to the axis of the holder, providing a means of continuously cooling the specimen irrespective of the high tilt angle and amount of liquid nitrogen present in the vessel. The Dewar neck design reduces entrapment of nitrogen gas bubbles and its shape prevents the spilling of liquid nitrogen at high tilt angles. The specimen holder has a retractable tip that completely encapsulates the specimen within a shielded environment internal to the specimen holder body. The cooling and specimen transfer mechanisms reduce thermal drift and the detrimental effects of vibrations generated by both the evaporation of liquid nitrogen present in the Dewar and other environmental effects.

Cryogenic specimen holder

An in situ optical specimen holder is disclosed which allows imaging and analysis during dynamic experimentation. This holder assembly includes a set of focusing and reflection optics along with an environmental cell. Electromagnetic radiation can be used to optically excite the specimen in the presence or absence of fluid and the source of such radiation may be located within the body of the holder itself. The spot size of the irradiation at the specimen surface can be varied, thus exciting only a specific region on the specimen. The window type cell provides a variable fluid path length ranging from the specimen thickness to 500 &#x3bc;m. The holder has the provision to continuously circulate fluids over the specimen. The pressure within the cell can be regulated by controlling the flow rate of the fluids and the speed of the pumps.

In situ holder assembly

An apparatus for preparing specimens for microscopy including equipment for providing two or more of each of the following specimen processing activities under continuous vacuum conditions: plasma cleaning the specimen, ion beam or reactive ion beam etching the specimen, plasma etching the specimen and coating the specimen with a conductive material. Also, an apparatus and method for detecting a position of a surface of the specimen in a processing chamber, wherein the detected position is used to automatically move the specimen to appropriate locations for subsequent processing.

Method and apparatus for preparing specimens for microscopy

An improved cryogenic specimen holder for imaging and analysis facilitates imaging at very high tilt angles with a large field of view. A retractable specimen holder tip protects the specimen during transport. An optimized Dewar design is positioned at a fixed, tilted angle with respect to the axis of the holder, providing a means of continuously cooling the specimen irrespective of the high tilt angle and the amount of liquid nitrogen present in the vessel. The Dewar neck design reduces the entrapment of nitrogen gas bubbles and its shape prevents the spilling of liquid nitrogen at high tilt angles. The specimen holder has a retractable tip that completely encapsulates the specimen within a shielded environment internal to the specimen holder body. The cooling and specimen transfer mechanisms reduce thermal drift and the detrimental effects of vibrations generated by both the evaporation of liquid nitrogen present in the Dewar as well as other environmental effects.

An in situ optical specimen holder is disclosed which may be utilized for imaging and analysis during dynamic experimentation. This holder assembly includes a set of focusing and reflection optics along with an environmental cell. Electromagnetic radiation can be used to optically excite the specimen in the presence or absence of fluid. A highly reflective mirror may be used to focus the radiation on to the specimen without the presence of any heating components within the cell. The spot size of the irradiation at the specimen surface can be varied, thus exciting only a specific region on the specimen. The window type cell provides a variable fluid path length ranging from the specimen thickness to 500 &#x3bc;m. The holder has the provision to continuously circulate fluids over the specimen. The pressure within the cell can be regulated by controlling the flow rate of the fluids and the speed of the pumps.

A milling device is disclosed for the preparation of microscopy specimens or other surface science applications through the use of ion bombardment. The device provides the ability to utilize both gross and fine modification of the specimen surface through the use of high and low energy ion sources. Precise control of the location of the specimen within the impingement beams created by the ion sources provides the ability to tilt and rotate the specimen with respect thereto. Locational control also permits the translocation of the specimen between the various sources under programmatic control and under consistent vacuum conditions. A load lock mechanism is also provided to permit the introduction of specimens into the device without loss of vacuum and with the ability to return the specimen to ambient temperature during such load and unload operation. The specimen may be observed and imaged during all active phases of operation.

Device and method for milling of material using ions

A specimen holding apparatus includes a main body, a specimen supporting surface provided on the main body, and a restraining element movable along the main body in a direction substantially parallel to the longitudinal axis of the main body from a first position in which the restraining element is removed from the specimen supporting surface to a second position in which the restraining element encroaches over the specimen supporting surface. An alternate specimen holding apparatus includes a main body, a specimen supporting surface provided on the main body in a first horizontal plane, and a restraining element attached to the main body that is rotatable in a second horizontal plane substantially parallel to the first horizontal plane between a first position in which the restraining element is removed from the specimen supporting surface and a second position in which the restraining element encroaches over the specimen supporting surface.

Specimen holding apparatus

A plasma processing method and apparatus are disclosed in which a low energy, high frequency plasma is utilized to remove both amorphous damage resulting from various specimen preparation techniques and contamination, mainly in form of hydrocarbons, from transmission electron microscopy specimens and specimen holders. The system comprises a vacuum system, a plasma chamber into which the specimen and the specimen holder are inserted, a housing having an access port with removable inner sleeve components, and a high frequency power supply which is coupled to the plasma chamber and enables both the generation and maintenance of the plasma. The inner sleeve components are preferably capable of accepting specimen holders produced by all manufacturers of transmission electron microscopes. In the preferred embodiment, the vacuum system comprises an oil-free vacuum system. To commence processing, the vacuum system is engaged for the evacuation of the plasma chamber for subsequent formation of the plasma. Processed gas may be introduced into the plasma chamber through the automated operation of various switches and valves. The plasma formation is preferably initiated through the coupling of an oscillating field to the plasma chamber. Many processed gas mixtures can be used. The preferred processed gas mixture comprises a mixture of twenty-five percent oxygen and seventy-five percent argon. The oxygen chemically reacts with hydrocarbons on the specimen and specimen holder and converts them to CO.sub.2 and H.sub.2 O. The argon provides the means to reduce specimen amorphous damage.

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Export, PA, United States of America

Paul E Fischione