Asml Netherlands B.v.

Paul Derwin

Kaustuve Bhattacharyya

Roy Werkman

Emil Peter Schmitt-Weaver

Erik Jensen

Pieter Gerardus Jacobus Smorenberg

Amir Bin Ismail

Theo Wilhelmus Maria Thijssen

Putra Saputra

Rowin Meijerink

Khalid Elbattay

Ma Su Su Hlaing

Bo Zhong

Masaya Komatsu

Hyun-Woo Yu

Gautam Sarma

A method for controlling a lithographic apparatus configured to pattern an exposure field on a substrate including at least a sub-field, the method including: obtaining an initial spatial profile associated with a spatial variation of a performance parameter associated with a layer on the substrate across at least the sub-field of the exposure field; and decomposing the initial spatial profile into at least a first component spatial profile for controlling a lithographic apparatus at a first spatial scale and a second component spatial profile for controlling the lithographic apparatus at a second spatial scale associated with a size of the sub-field, wherein the decomposing includes co-optimizing the first and second component spatial profiles based on correcting the spatial variation of the performance parameter across the sub-field.

Sub-field control of a lithographic process and associated apparatus

Corrections are calculated for use in controlling a lithographic apparatus. Using a metrology apparatus a performance parameter is measured at sampling locations across one or more substrates to which a lithographic process has previously been applied. A process model is fitted to the measured performance parameter, and an up-sampled estimate is provided for process-induced effects across the substrate. Corrections are calculated for use in controlling the lithographic apparatus, using an actuation model and based at least in part on the fitted process model. For locations where measurement data is available, this is added to the estimate to replace the process model values. Thus, calculation of actuation corrections is based on a modified estimate which is a combination of values estimated by the process model and partly on real measurement data.

Mark position determination method

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Eindhoven, Netherlands

Paul Derwin