Applied Materials, Inc.

Paul Chhabra

Pravin K Narwankar

Son Truong Nguyen

Alan Hiroshi Ouye

Kenric T Choi

Shreyas Kher

Paul L Deaton

Khai Ngo

Dien-Yeh (Daniel) Wu

A method and apparatus for providing a precursor to a process chamber is described. The apparatus comprises an ampoule capable of receiving either a liquid precursor source material or a solid precursor source material. The ampoule is capable of delivering either a liquid precursor material to a vaporizer coupled to the process chamber, or a vaporized or gaseous precursor material to the process chamber. The ampoule also includes a continuous level sensor to accurately monitor the level of precursor source material within the ampoule.

Ampoule for liquid draw and vapor draw with a continuous level sensor

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Austin, TX, United States of America

Paul Chhabra