Corning Incorporated

Corning Glass Works

Paul Arthur Sachenik

Nicholas Francis Borrelli

Robert Alan Bellman

Shandon Dee Hart

James Joseph Price

Guangli Hu

David L Morse

Heather Bossard Decker

Thomas Paul Grandi

Ikerionwu Asiegbu Akwani

Chad Byron Moore

Lili Tian

Karl William Koch, Iii

Ljerka Ukrainczyk

Prantik Mazumder

Charles Andrew Paulson

Mark Alejandro Quesada

Kaveh Adib

Valerio Pruneri

Robert George Manley

Jeffery Alan DeMeritt

Donald B Keck

Thomas H Elmer

Francis P Fehlner

Jose Mario Quintal

Ta-Ko Chuang

Albert Carrilero

Lynn Bernard Simpson

Robert H Bellman

Jeremy Curtis Clark

Johann Osmond

Thomas E Patykula

One or more aspects of the disclosure pertain to an article including a film disposed on a glass substrate, which may be strengthened, where the interface between the film and the glass substrate is modified, such that the article has an improved average flexural strength, and the film retains key functional properties for its application. Some key functional properties of the film include optical, electrical and/or mechanical properties. The bridging of a crack from one of the film or the glass substrate into the other of the film or the glass substrate can be suppressed by inserting a nanoporous crack mitigating layer between the glass substrate and the film.

Articles with a low-elastic modulus layer and retained strength

A method of forming a hermetic barrier layer comprises sputtering a thin film from a sputtering target, wherein the sputtering target includes a sputtering material such as a low Tglass, a precursor of a low Tglass, or an oxide of copper or tin. During the sputtering, the formation of defects in the barrier layer are constrained to within a narrow range and the sputtering material is maintained at a temperature of less than 200&#xb0; C.

High rate deposition systems and processes for forming hermetic barrier layers

Disclosed are AZO films deposited on a transparent substrate by pulse DC using an oxide target with a composition in the range 0.5-2 wt % AlO, desirably at temperature above 325&#xb0; C., resulting in films showing columnar grain structure with columns extending from the top to the bottom of the film, and small lateral grain size (less than 70 nm from substrate to top of film). The film has low resistivity at less than 10 Ohm/square at a thickness less than 400 nm, resistivity is desirably unchanged by annealing at temperatures of up to 450&#xb0; C.

Sputtered transparent conductive aluminum doped zinc oxide films

Embodiments of this disclosure pertain to articles that exhibit scratch-resistance and improved optical properties. In some examples, the article exhibits a color shift of about 2 or less, when viewed at an incident illumination angle in the range from about 0 degrees to about 60 degrees from normal under an illuminant. In one or more embodiments, the articles include a substrate, and an optical film disposed on the substrate. The optical film includes a scratch-resistant layer and a refractive index gradient. In one or more embodiments, the refractive index includes a refractive index that increases from a first surface at the interface between the substrate and the optical film to a second surface. The refractive index gradient may be formed from a compositional gradient and/or a porosity gradient.

Scratch-resistant articles with a gradient layer

Described herein are various methods for making textured articles, textured articles that have improved fingerprint resistance, and methods of using the textured articles. The methods generally make use of masks comprising nanostructured metal-containing features to produce textured surfaces that also comprise nanostructured features. These nanostructured features in the textured surfaces can render the surfaces hydrophobic and oleophobic, thereby beneficially providing the articles with improved fingerprint resistance relative to similar or identical articles that lack the texturing.

Textured surfaces and methods of making and using same

A substrate includes an opaque chrome coating on a surface of the substrate dry-etched to form an aperture, wherein chrome in the aperture is below detectable limit. A method of forming an opaque chrome coating on a substrate includes depositing an initial thickness of the opaque chrome coating on the substrate without ion-assist or with undetectable ion-assist and depositing the remainder of the opaque chrome coating with or without ion-assist. In one embodiment the invention is directed to an apertured optical element having a substrate transmissive to light and an opaque chrome coating on the substrate defining an aperture. Three- and four-layer opaque coatings of various materials are disclosed, including three-layer chrome/chrome oxide/chrome coatings.

Optical element with an opaque chrome coating having an aperture and method of making same

The present invention provides a method of manufacturing optical devices which includes the steps of providing a substrate and forming at least one optical layer on the substrate. The optical layer is formed by a chemical vapor deposition (CVD) process which includes a deuterated source gas. The present invention also provides an optical device which includes a substrate and an optical layer including deuterium.

Using deuterated source gases to fabricate low loss GeSiON and SiON waveguides

Polarizing glass having localized regions or patterns of non-polarizing glass is disclosed. The glass is formed by use of reducing gas-blocking material, by local thermal heating of the glass, or by an etching technique.

Polarizing glasses having integral non-polarizing regions

A composition represented by the formula Si Ge O N , wherein x is from about 0.05 to about 0.6 and y is from about 0.14 to about 0.74 exhibits properties highly suited for use in fabricating waveguides for liquid crystal based optical devices. In particular, the compositions have an index of refraction of from about 1.6 to about 1.8 for light at a wavelength of 1550 nm, and/or a coefficient of thermal expansion of from about 2.5&times;10 C to about 5.0&times;10 &deg; C. . The compositions also have inherently low hydrogen content, and a high hydrogen permeability which allows better hydrogen removal by thermal annealing to provide a material which exhibits low optical losses and better etching properties than alternative materials.

Germanium silicon oxynitride high index films for planar waveguides

A composition represented by the formula Si Ge O N , wherein x is from about 0.05 to about 0.6 and y is from about 0.14 to about 0.74 exhibits properties highly suited for use in fabricating waveguides for liquid crystal based optical devices. In particular, the compositions have an index of refraction of from about 1.6 to about 1.8 for light at a wavelength of 1550 nm, and/or a coefficient of thermal expansion of from about 2.5&times;10 &deg; C. to about 5.0&times;10 &deg; C. . The compositions also have inherently low hydrogen content, and a high hydrogen permeability which allows better hydrogen removal by thermal annealing to provide a material which exhibits low optical losses and better etching properties than alternative materials.

A method for producing a glass panel for silicon device fabrication, which method comprises forming a noncrystalline, or mixed-phase, silicon film on a glass substrate, the glass having a strain point greater than 560.degree. C., and subjecting the filmed glass to a heat treatment comprising heating at a temperature of at least 550.degree. C. for a period of time sufficient to convert the silicon film to polycrystalline silicon and to compact the glass.

Silicon device production

Growing community of inventors

Corning, NY, United States of America

Paul Arthur Sachenik