E.i. Dupont De Nemours and Company

Du Pont-howson Limited

Paul A Styan

Stephen D Rigby

Michael Ingham

A developer liquid for image-wise exposed radiation sensitive compositions comprises ethyl hexyl sulphate, a surfactant, and alkaline material such that the pH is al least 12 and preferably at least 13.5. The developer liquid may additionally include a water soluble carboxylic acid salt such as sodium octanoate and the sodium salt of ethylene diamine tetra acetic acid. Such developer liquids can be formulated for use with both positive-working and negative-working compositions.

Developer solution comprising ethyl hexyl sulphate, a surfactant, an

In a process for treating a radiation sensitive member which includes image-wise exposure to radiation, development and burning-in of the member, after the development and prior to the burning-in, an aqueous solution including ethyl hexyl sulphate is applied to the member.

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Leeds, United Kingdom

Paul A Styan