Asml Netherlands B.v.

Patrick Willem Paul Limpens

Frits Van Der Meulen

Hendrikus Herman Marie Cox

Ronald Cornelis Gerardus Gijzen

Christiaan Alexander Hoogendam

Raymond Wilhelmus Louis Lafarre

Harmen Klaas Van Der Schoot

David Ferdinand Vles

Adrianus Hendrik Koevoets

Gosse Charles De Vries

Sander Catharina Reinier Derks

Jim Vincent Overkamp

Martinus Agnes Willem Cuijpers

Koos Van Berkel

Christiaan Louis Valentin

Jacobus Cornelis Gerardus Van Der Sanden

Alain Louis Claude Leroux

Stan Henricus Van Der Meulen

Dries Vaast Paul Hemschoote

Erik Johan Arlemark

Joost De Hoogh

Bart Friso Riedstra

Gerard Johannes Boogaard

Paul Comé Henri De Wit

Evert Auke Rinze Westerhuis

Michaël Johannes Anna Maria Walters

An actuator, configured to move a first object with respect to a second object, that includes a first body having an annular ring, a second body, arranged movably with respect to the first body, having a longitudinal shaft at least partially disposed within the annular ring, and at least one spring device, arranged between the first body and the second body, wherein the at least one spring device is configured to guide relative movements between the first body and the second body in a range of movement, and the at least one spring device has two or more leaf springs, wherein each of the two or more leaf springs is connected to the first body and to the second body, and wherein at least one of the leaf springs is in a non-planar state when the spring device is in an equilibrium position.

Guiding device

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

Lithographic apparatus

The invention pertains to a stage system, and to a lithographic apparatus and a method for manufacturing a device in which a stage system is used. In the stage system a positioning system is provided comprising an actuator adapted to position an object table. The actuator comprises a magnet assembly and a coil assembly. The magnet assembly comprises a first magnetic body and a second magnetic body, which are in use subjected to a internal magnetic force. The magnet assembly has a separate interface for connecting each magnetic body to the object table separately. The magnet assembly further comprises a spacer device, which holds the first and second magnetic body at a relative distance to each other in at least the direction of the internal magnetic force.

Stage system, lithographic apparatus and device manufacturing method

Growing community of inventors

Uden, Netherlands

Patrick Willem Paul Limpens