Motorola Corporation

Patrick Thompson

Barbara Vasquez

William M Williams

Marlene J Begay

A system and method for aligning a semiconductor device (10) to a fixture (11) is provided. A first physical alignment feature (12) on the semiconductor device (10) and a second physical alignment (24) on the fixture (11) mate to align and hold the semiconductor device (10) in place. In one embodiment the physical alignment features (12) and (24) are produced using standard photolithography techniques, resulting in precise alignment features. In another embodiment the physical alignment features (12) and (24) are designed and placed to control the direction the thermal expansion of the semiconductor device (10) relative to the fixture (11).

Method for aligning a semiconductor device

A method for etching silicon wafers having a (100) or (110) crystallographic orientation. The method includes using an etching solution consisting essentially of potassium hydroxide (KOH) and water. This allows for an optimum combination of etch rate and etch quality.

Growing community of inventors

Gilbert, AZ, United States of America

Patrick Thompson