National Technology & Engineering Solutions of Sandia, LLC

Sandia Corporation

Patrick Sean Finnegan

David Bruce Burckel

Christian Lew Arrington

Andrew E Hollowell

David R Wheeler

Timothy N Lambert

Amber Lynn Dagel

Cody M Washburn

Eric Langlois

Robert L Jarecki, Jr

Todd Monson

Kyle Thompson

Jamin Ryan Pillars

Eric John Schindelholz

Travis Ryan Young

Roger Derek West

Stephen M Carr

Kalin Baca

Juan Pedro Mendez Granado

Christopher Dyck

Lee Taylor Massey

Jennifer Marie Strong

Jesse John Bland

Michael C Hamel

Johnathan Mulcahy-Stanislawczyk

Ryan Nicolas Goodner

A mask for use in a speckle-based x-ray or neutron phase contrast imaging system and methods of making the mask are disclosed. The mask may either absorb or change the phase of the incident x-ray or neutron beam. The mask in various embodiments has consistent statistics across the mask, is locally unique (thereby avoiding ambiguous correlations), has a speckle size on the order of the imaging system's resolution, has a speckle pattern that is visible through the sample being imaged, and/or is matched to the energy level of the imaging system and the sample density. These mask attributes are controlled by the method and materials used in the fabrication of the mask. Various embodiments use a pseudo-random binary array for generating the required speckle pattern.

Speckle-based imaging diffuser and method for controllably fabricating same

A Meissner-Effect Transition-Edge-Sensor (ME-TES) microcalorimeter device may have one or more microcalorimeter elements, each including an absorber body composed of a superconductive element that is arranged to absorb incoming photons or radiative particles. A planar pickup coil substantially surrounds the absorber body and is located within a magnetic sensing distance of the absorber body. Absorption of incoming photons or radiative particles increases the temperature of the superconductive element, resulting in a change in magnetic flux through the superconductive element. This change in magnetic flux induces a transient electric current in the planar pickup coil that may be sensed using a readout circuit. A method is provided for fabricating an ME-TES microcalorimeter device.

Meissner-effect transition-edge-sensor microcalorimeter

A method is provided for making gratings of gold or other metal in silicon substrates. The disclosed method may achieve high aspect ratios. According to the disclosed method, a silicon wafer is through-etched. A seed layer of metal is vapor-deposited on one side of the wafer, and a layer of metal is electrodeposited on the seed layer. The electrodeposited metal plugs the trenches and provides a conductive surface for subsequent electrodeposition. The trenches are then filled by electrodeposition from within the trenches, so that the walls of the metal grating grow on the metal plugs.

High aspect ratio gratings fabricated by electrodeposition

The present invention relates to a method of fabricating an electrode array, in which an underlying handle wafer is removed to provide a planar device having the electrode array. Also provided are wafers including a plurality of planar devices having an electrode array, as well as sensors including such an electrode array.

Planar electrode arrays and fabrication methods thereof

The various technologies presented herein relate to formation of carbon micromechanical systems (CMEMS), wherein the CMEMS comprise multiple layers of carbon structures and are formed using a plurality of photoresist precursors that are processed to form carbon. The various embodiments can be utilized in producing a plurality of CMEMS with full production level fabrication, e.g., 6 inch wafers can be processed. A pyrolyzed layer of carbon is lithographically defined after pyrolysis, wherein the post-pyrolysis etch process can produce carbon structures having repeatable and accurate device geometries, with straight sidewalls. A sacrificial layer can be applied to facilitate separation of a first carbon layer from a second carbon layer, wherein, upon pyrolysis to form the second carbon layer and lithography thereof, the sacrificial layer is removed to form a CMEMS comprising a first carbon layer (e.g., comprising bottom contacts) located beneath a second carbon layer (e.g., a mechanical layer).

Fabrication of multilayered carbon MEMS devices

A magnetoelastically actuated device includes a microscale cantilever arm supported at a standoff distance from a substrate. The cantilever arm is formed as a laminar magnetic actuator configured to bend when it is subjected to a magnetic field. The cantilever arm includes a film of magnetostrictive material. Also provided is a method for fabricating the magnetoelastically actuated device. The method includes defining an actuator mold in a layer of photoresist on a structural layer of the cantilever arm and electrodepositing a layer of a magnetostrictive alloy containing cobalt and iron onto the structural layer within the actuator mold.

Magnetoelastically actuated MEMS device and methods for its manufacture

Wafer scale oblique angle etching of a semiconductor substrate is performed in a conventional plasma etch chamber by using a fixture that supports a multiple number of separate Faraday cages. Each cage is formed to include an angled grid surface and is positioned such that it will be positioned over a separate one of the die locations on the wafer surface when the fixture is placed over the wafer. The presence of the Faraday cages influences the local electric field surrounding each wafer die, re-shaping the local field to be disposed in alignment with the angled grid surface. The re-shaped plasma causes the reactive ions to follow a linear trajectory through the plasma sheath and angled grid surface, ultimately impinging the wafer surface at an angle. The selected geometry of the Faraday cage angled grid surface thus determines the angle at with the reactive ions will impinge the wafer.

Wafer scale oblique angle plasma etching

A microporous carbon scaffold is produced by lithographically patterning a carbon-containing photoresist, followed by pyrolysis of the developed resist structure. Prior to exposure, the photoresist is loaded with a nanoparticulate material. After pyrolysis, the nanonparticulate material is dispersed in, and intimately mixed with, the carbonaceous material of the scaffold, thereby yielding a carbon composite structure.

Lithographically defined microporous carbon-composite structures

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Albuquerque, NM, United States of America

Patrick Sean Finnegan