Alcatel

Patrick Pilotti

Philippe Maquin

Jean-François Vuillermoz

Pascal Durand

Jean-François Grosdaillon

Claude Rousseau

The present invention provides a multistage vacuum pump comprising at least a low pressure first stage and at least a high pressure second stage. At least one of the stages has at least one suction inlet for admitting gas to be pumped, and at least one of the stages has at least one delivery outlet that is open to the outside for exhausting pumped gas. The first and second stages communicate with each other in order to pass gas from the first stage to the second stage. The first stage operates at a flow rate that is smaller than that of the second stage. For an oil-seal rotary vane positive-displacement pump, the oil is injected into the stage having the greater flow rate.

Multistage vacuum pump and a pumping installation including such a pump

The invention relates to a system for regulating the pressure in an enclosure ( ) that is to contain processed gas for manufacturing semiconductor components or micro- or nano-technology devices, the enclosure being connected by pipework ( ) to a pump unit ( ) comprising a dry mechanical primary pump ( ) and at least one secondary pump ( ). According to the invention, the system further comprises a speed controller ( ) controlling simultaneously the speeds of rotation of the dry mechanical primary pump ( ) and of said at least one secondary pump ( ).

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Cran-Gevrier, France

Patrick Pilotti