Kla Tencor Corporation

Patrick LoPresti

John Fielden

Abdurrahman Sezginer

Rui-Fang Shi

Yalin Xiong

Joe Blecher

Carl Hess

John D Miller

Shan Xue

Block-to-block reticle inspection includes acquiring a swath image of a portion of a reticle with a reticle inspection sub-system, identifying a first occurrence of a block in the swatch image and at least a second occurrence of the block in the swath image substantially similar to the first occurrence of the block and determining at least one of a location, one or more geometrical characteristics of the block and a spatial offset between the first occurrence of the block and the at least a second occurrence of the block.

Block-to-block reticle inspection

A semiconductor inspection apparatus performs a hybrid inspection process including cell-to-cell inspection, die-to-die inspection and die-to-golden or die-to-database inspection. The apparatus creates a golden image of a reticle complimentary to portions of the reticle that can be inspected by cell-to-cell inspection or die-to-die inspection. Alternatively, the apparatus creates a reduced database complimentary to portions of the reticle that can be inspected by cell-to-cell inspection or die-to-die inspection.

Method and system for hybrid reticle inspection

Growing community of inventors

San Jose, CA, United States of America

Patrick LoPresti