Texas Instruments Corporation

Other

Patrick Ian Oden

James Norman Hall

William Craig McDonald

James Carl Baker

Sandra S Zheng

Terry Alan Bartlett

Richard Lee Knipe

James D Huffman

Rabah Mezenner

Anthony DiCarlo

Thomas George Thundat

Lance W Barron

Stephen Aldridge Shaw

Robert L Jones

Simon Joshua Jacobs

Adam Joseph Fruehling

Larry J Hornbeck

Robert J Warmack

Charles L Britton, Jr

Panagiotis George Datskos

Jason Michael Neidrich

William Louis Bryan

Robert S Black

William C Mcdonald

A method of aligning optical signals in a fiber optic switching device with one or two phase light modulators (PLMs) includes configuring the phase elements of the PLMs with first initial settings, to direct an optical signal from an input fiber to an output fiber. An initial position displacement of a center of the signal image from a center of the output fiber is estimated. Corrected settings for the phase elements are calculated so that when the corrected settings are applied to the phase elements, a corrected signal image of the optical signal has a corrected position displacement from the center of the output fiber that is less than the initial position displacement. A fiber optic switching device has processing circuitry and a memory component configured to execute steps of the method of aligning the optical signals.

Rapid fiber optic alignment techniques for optical switching

An integrated circuit includes an electrode voltage controller, a micro-electromechanical system (MEMS) structure, and a bias voltage generator. The MEMS structure has a first electrode, a conductive plate, and a reflective layer on the conductive plate. The first electrode is coupled to the electrode voltage controller, and the conductive plate is configured to move vertically with respect to the first electrode responsive to a voltage generated by the electrode voltage controller and applied to the first electrode. The bias voltage generator is coupled to the conductive plate. The bias voltage generator has an input configured to receive a bias control signal. The bias voltage generator is configured to apply a non-zero bias voltage to the conductive plate responsive to the bias control signal.

Bias voltage adjustment for a phase light modulator

In an example, a system includes a digital micromirror device (DMD). The DMD includes a hinge and one or more spring tips coupled to the hinge, where the hinge is configured to tilt toward a raised address electrode. The DMD includes a micromirror including a recessed mirror shelf and a reflective surface, where the recessed mirror shelf is coupled to the hinge, and where the recessed mirror shelf is configured to contact at least one of the one or more spring tips responsive to the hinge tilting toward the raised address electrode.

Microelectromechanical systems contact area reduction

In described examples, a microelectromechanical system (MEMS) includes a first element and a second element. The first element is mounted on a substrate and has a first contact surface. The second element is mounted on the substrate and has a second contact surface that protrudes from the second element to form an acute contact surface. The first element and/or the second element is/are operable to move in: a first direction, such that the first contact surface comes in contact with the second contact surface; and a second direction, such that the second contact surface separates from the first contact surface.

Isolated protrusion/recession features in microelectromechanical systems

In one example, a method comprises forming a first layer on a substrate surface, forming an opening in the first layer, forming a second layer on the first layer and in the opening, and forming a photoresist layer on the second layer, in which the photoresist layer has a first curved surface over a first part of the first layer and over the opening. The method further comprises etching the photoresist layer and a second part of the second layer over the first part of the first layer to form a second curved surface on the second part of the second layer, and forming a mirror element and a support structure in the second layer, including by etching a third part of the second layer and removing the first layer.

Surface micromachined structures

In described examples, a system (e.g., a microelectromechanical system) includes a substrate, a support coupled to the substrate and a first and second element. The first element includes a contactor spring having a first portion coupled to the support and having a second portion including a cavity having a sloped surface. A clearance from the sloped surface to the substrate is widened as the sloped surface extends away from the first portion. The second portion includes a first contact surface adjacent to the sloped surface. The second element is coupled to the substrate and has a second contact surface adjacent to the first contact surface. One of the first element and the second element is adapted: in a first direction to urge the first contact surface and the second contact surface together; and in a second direction to urge the first contact surface and the second contact surface apart.

Microelectromechanical system contactor spring

Described examples include an apparatus having a substrate with a substrate surface. The apparatus also includes an element with a planar surface facing the substrate surface and with a nonplanar surface opposite the planar surface facing away from the substrate surface.

A spatial light modulator (SLM) has an array of pixels configured to modulate light in patterns responsive to first control signals. The modulated light forms at least one patterned light beam in a field of view. An illumination source is optically coupled to the SLM. The illumination source is configured to illuminate the array of pixels, responsive to second control signals. Circuitry is coupled to the SLM and to the illumination source. The circuitry is configured to provide the first control signals to the SLM and the second control signals to the illumination source. At least one detector is configured to detect a reflection of the patterned light beam in the field of view.

LIDAR with spatial light modulator

Isolated protrusion/recession features in a micro electro mechanical system

In described examples, a system for outputting a patterned light beam includes a digital micro-mirror device having an array of micro-mirrors. Diffraction patterns displayed using the digital micro-mirror device create at least one patterned light beam in a field of view. An illumination source illuminates the array of micro-mirrors in the digital micro-mirror device. The system includes a processor coupled to provide display diffraction patterns for display using the digital micro-mirror device and to control the illumination source, and at least one detector to detect light from the patterned light beam that reflects from objects in the field of view.

Methods and apparatus for LIDAR with DMD

A method of forming a micro-electromechanical systems (MEMS) pixel, such as a DMD type pixel, by forming a substrate having a non-planar upper surface, and depositing a photoresist spacer layer upon the substrate. The spacer layer is exposed to a grey-scale lithographic mask to shape an upper surface of the spacer layer. A control member is formed upon the planarized spacer layer, and an image member is formed over the control member. The image member is configured to be positioned as a function of the control member to form a spatial light modulator (SLM). The spacer layer is planarized by masking a selected portion of the spacer layer with a grey-scale lithographic mask to remove binge in the selected portion.

Operation/margin enhancement feature for surface-MEMS structure; sculpting raised address electrode

A method of forming a micro-electromechanical systems (MEMS) pixel, such as a DMD-type pixel, by depositing a photoresist spacer layer upon a substrate. The photoresist spacer layer is exposed to a grey-scale lithographic mask to shape an upper surface of the photoresist spacer layer. A control member is formed upon the shaped spacer layer, and has a sloped portion configured to maximize energy density. An image member is configured to be positioned as a function of the control member to form a spatial light modulator (SLM).

Sloped electrode element for a torsional spatial light modulator

A MEMS device is formed with facing surfaces of a contoured substrate and a layer of material having complementary contours. In one fabrication approach, a first photoresist layer is formed over a substrate. Selected regions of the first photoresist layer are exposed using a patterning mask. The exposed regions of the first photoresist layer are thermally shrunk to pattern the first photoresist layer with a contour. A layer of material is formed over the contoured first photoresist layer.

MEMS device with non-planar features

A deformable element for use in microelectromechanical systems comprises a core layer and a protective layer. The protective layer is capable of deterring combinations of undesired chemical components in operational environments with the core layer of the deformable element.

Multilayered deformable element with reduced memory properties in a MEMS device

Provided are a system and method for reducing failures due to hinge memory. The method, in one embodiment, includes providing a torsional element having an amount of hinge memory, wherein the hinge memory is at least partially created using an average operational temperature. The method, in this embodiment, further includes subjecting the torsional element having the hinge memory to a temperature equal to or greater than the average operational temperature while the torsional element is in a parked state for an amount of time to reduce the amount of the hinge memory.

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McKinney, TX, United States of America

Patrick Ian Oden