Arch Specialty Chemicals, Inc.

Other

Cytyc Corporation

Patrick Foster

John Joseph Biafore

Andrew J Blakeney

Sydney George Slater

Gregory Domenic Spaziano

Binod B De

Thomas Steinhausler

Thomas Steinh&auml;usler

Sanjay Malik

Sidney George Slater

Marc Groskreutz

Thomas Steinhäusler

A method is provided for improving the shelf-life of a nuclear staining solution. In particular, the present invention provides a method of adding an antioxidant to a hematoxylin staining solution which maintains the performance of the stain over its shelf-life.

Method for improving the shelf-life of hematoxylin staining solutions

The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.

Hydroxy-amino thermally cured undercoat for 193 nm lithography

Polymers and co-polymers having monomeric units formed by the polymerization of monomers of the Structure Iwhere Ris a moiety containing an ethylenically unsaturated polymerizable group, Ris a C-Calkylene group, and Ris a Clinear or cyclic alkyl group, a Caromatic or substituted aromatic group, a Calkoxy methyl, or a Calkoxy ethyl group, are useful as binder resins for photosensitive compositions, and processes for photolithography in the production of semiconductor devices and materials.

Photosensitive bilayer composition

Thermally cured undercoat for use in lithography of a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator, wherein the hydroxyl containing polymer is a polymer comprising units m, n and o of the following formula:wherein Ris H or methyl; Ris a substituted or unsubstituted C-Caryl acrylate or C-Caryl methacrylate group wherein the substituted groups may be phenyl, Calkyl or Calkoxy; Ris a hydroxyl functionalized C-Calkyl acrylate, methacrylate or C-Caryl group, Ris a C-Clinear or branched alkylene; p is an integer of from 1 to 5 with the proviso that there are no more than thirty carbon atoms in the [&#x2014;RO&#x2014;]; Ris a C-Clinear, branched or cyclic alkyl, substituted or unsubstituted C-Caryl, or substituted or unsubstituted C-Calicyclic hydrocarbon; and m is about 40 to 70, n is about 15 to 35 and o is about 15 to 25.

Thermally cured underlayer for lithographic application

Hydroxy-amino thermally cured undercoat of 193 nm lithography

The present invention is directed to a thermally curable polymer composition comprising a hydroxyl-containing polymer and a polyfunctional epoxide as a crosslinking agent. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography. In addition, the present invention also relates to a photolithographic coated substrate comprising: a substrate, the thermally cured undercoat composition on the substrate, and a radiation-sensitive resist topcoat on the thermally cured undercoat composition. Furthermore, the present invention further relates to a process for using the photolithographic coated substrate for the production of relief structures.

Hydroxy-epoxide thermally cured undercoat for 193 NM lithography

Hydroxy-amino thermally cured undercoat for 193 NM lithography

Radiation sensitive resins for use in a top layer resists in bilayer systems for use in deep UV photolithography comprises copolymers having the following structural units: ##STR1## and optionally, ##STR2## wherein n is an integer of 1 to 5, R.sup.1 is methyl or trimethylsiloxy, R.sup.2 is a tert-butyl group, R.sup.3, R.sup.4 and R.sup.5 are each independently hydrogen or a methyl group.

Radiation sensitive copolymers, photoresist compositions thereof and

The present invention is directed to a thermally curable polymer composition comprising a hydroxyl-containing polymer and a polyfunctional isocyanate as a crosslinking agent, which is particularly useful in photolithographic coating of substrates. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography. Furthermore, the present invention further relates to a process for using the photolithographic coated substrate for the production of relief structures.

Hydroxy-diisocyanate thermally cured undercoat for 193 nm lithography

A portable snow skier rope towing system comprises: an endless loop of flexible tow rope; a series of pulleys supporting the endless loop of tow rope for driving about an elongated enclosed path, the elongated path having opposed extreme ends, each extreme end being defined by at least one pulley; a supporting frame; a motor operably mounted relative to the supporting frame, the motor having an output drive; and a winch apparatus operably connected with the motor output drive and relative to the supporting frame, the tow rope passing through the winch at a location within the enclosed path which is displaced from each of the extreme end pulleys, the winch apparatus comprising: a drive wheel mounted for rotation and engagement with the output drive, the drive wheel having a circumference with a tapered groove formed thereabout which receives the tow rope; a rope inlet wheel mounted for rotation adjacent the drive wheel, the inlet wheel having a circumferential groove which receives the tow rope; and a rope outlet pinch wheel mounted for rotation adjacent the drive wheel, the tow rope being received about the pinch wheel, the pinch wheel being mounted for selective movement relative to the drive wheel to urge the tow rope into the tapered circumferential drive wheel groove; the drive wheel, inlet wheel, and pinch wheel being positioned relative to one another such that the tow rope is received about at least 180.degree. and less than 360.degree. of the drive wheel circumference.

Growing community of inventors

Franklin, MA, United States of America

Patrick Foster