Asml Holding N.v.

Patrick De Jager

Cheng-Qun Gui

Robert D Harned

Lev Sakin

Noreen Harned

Irina I Pozhinskaya

An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage and a substrate stage. A magnification reflective optical system images the reticle onto the substrate. The system may be a 2&#xd7; magnification system, or another magnification that is compatible with currently available mask sizes. By writing reticles with circuit pattern dimensions that are one-half the desired size for an FPD, a 2&#xd7; optical system can be used to expose FPDs. The designs for the 1.5&#xd7; and larger magnification optical systems all typically have at least three powered mirrors. A corrector, positioned either near the reticle or near the substrate, can be added to the three mirror design to improve the systems optical performance. The corrector may be a reflective, or a refractive design. The corrector can have an aspheric surface, and optionally a powered surface.

Large field of view 2X magnification projection optical system for FPD manufacture

An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage adapted to support a reticle. A substrate stage is adapted to support a substrate. A reflective optical system is adapted adapted to image the reticle onto the substrate. The reflective optical system includes a primary mirror including a first mirror and a second mirror, and a secondary mirror. The reflective optical system has sufficient degrees of freedom for both alignment and correction of third order aberrations when projecting an image of the reticle onto the substrate by reflections off the first mirror, the secondary mirror, and the second mirror.

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Veldhoven, Netherlands

Patrick De Jager