Asml Netherlands B.v.

Fei Comapny

Patrick David Vogelsang

Erik Roelof Loopstra

Tom Van Zutphen

Martinus Cornelis Reijnen

Thomas J M Castenmiller

Andreas B G Ariens

Martinus H H Hoeks

YimBun P Kwan

Frits Van Der Meulen

Stoyan Nihtianov

Marcel Koenraad Marie Baggen

Eric Gerardus Theodoor Bosch

Frank Auer

Remko Wakker

Albertus Aemillius Seyno Sluijterman

Johannes Adrianus Carolus Cooijmans

Olaf Hubertus Wilhelmus Van Bruggen

Johannes Roland Dassel

The invention relates to a charged particle detector system comprising a conversion plate () to convert incoming radiation to secondary electrons. These secondary electrons are then detected by a secondary electron detector (), thereby providing information of the incoming radiation. Often this information is limited to, in first approximation, the flux of incoming radiation. In the case of, for example, backscattered electrons this is the current of the incoming backscattered electrons. The invention proposes to form the conversion plate as, for example, an energy dependent detector, for example a photodiode to detect electrons, so that the detector system simultaneously provides information of, for example, current (S) and mean energy (S) of the incoming radiation. The detector system is especially suited for use in a SEM or a DualBeam apparatus.

Charged particle detector system comprising a conversion electrode

A sensor includes a semiconductor body having a top and bottom surface, a first doped surface oriented region of a first conductivity type at the top surface, and a second doped surface oriented region of a second and opposite conductivity type at the bottom surface, wherein a sensitive area is defined where the first region overlaps with the second region. A resistive layer is partially arranged in the sensitive area. The sensor includes two first electrode contacts and two second electrode contacts, wherein the first electrode contacts are placed on the resistive layer to define a first detection area in the sensitive area between the first electrode contacts, and wherein the second electrode contacts are placed partially in the sensitive area on the bottom surface of the body, the surfaces of the second electrodes in the sensitive area defining a second detection area that overlaps with the first detection area.

Optical position sensor, a position sensitive detector, a lithographic apparatus and a method for determining an absolute position of a movable object to be used in a relative position measurement system

A lithographic apparatus having a stationary magnet motor to drive a support such as a substrate support or a patterning device support, may be provided with a measurement system to measure a position of the support in question, e.g., to provide a safety system to prevent a collision of the support with another part. The measurement system may be configured to measure a magnetic field strength of an alternating magnetic field generated by the magnet assembly of the stationary magnet motor, and/or measure generation of eddy currents in a metallic layer shielding the magnet assembly in combination with an inductance measurement of an electromagnet generating the alternating magnetic field causing the eddy currents, and/or measure light using an optical position sensitive sensor such as a CCD metric or linear photodiode positioned in a light plane emitted by an emitter.

Lithographic apparatus and position sensor

A position measuring apparatus includes a radiation source mounted on an isolated reference frame and a two-dimensional radiation detector mounted adjacent the radiation source. The object whose position is to be detected has a retro-reflector mounted on it so as to reflect light emitted from the radiation source along a return path that is parallel to but displaced from the incident light path. The amount of displacement is dependent on the position of the object and is measured by the two-dimensional detector. Three such apparatus can be combined in a system to measure the position of the object in all six degrees of freedom.

Position measuring system for use in lithographic apparatus

A position measuring device includes a radiation source mounted on an isolated reference frame and a two-dimensional radiation detector mounted adjacent the radiation source. The object whose position is to be detected has a mirroring device, e.g. a retro-reflector, mounted on it so as to reflect light emitted from the radiation source along a return path that is parallel to but displaced from the incident light path. The amount of displacement is dependent on the position of the object and is measured by the two-dimensional detector. Three such devices can be combined in a system to measure the position of the object in all six degrees of freedom.

Position measuring device, position measuring system, lithographic apparatus, and device manufacturing method

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Eindhoven, Netherlands

Patrick David Vogelsang