3m Innovative Properties Company

Minnesota Mining and Manufacturing Company

Daniel C. Snustad

Patricia M. Savu

Patricia M Savu

William M Lamanna

Marc Dudley Radcliffe

Daniel C Snustad

Michael J Parent

Richard M Flynn

Terence D Spawn

Gilbert C Johnson

David B Olson

Jason M Kehren

George G I Moore

John C Hansen

Eugene P Janulis

George G Moore

Michael J Sierakowski

Sandra A Etienne

Thomas P Klun

Diane North

Mark W Grenfell

Michael P Keyes

Zai-Ming Qiu

Timothy J Hebrink

Miguel Antonio Guerra

Chetan P Jariwala

John J Gagliardi

Takashi Amano

Patrick A Thomas

Steven J Martin

Richard M Stern

Peter M Olofson

Stefan A Babirad

John F Kistner

Jeffrey G Linert

Jerome W McAllister

Lawrence A Zazzera

Zhongxing Zhang

Jennifer E Waddell

Roger K Yonkoski

Amy J Gates

Stephen D Polson

Naiyong Jing

George W Griesgraber

Thomas Edward Wood

Michael A Kropp

Wayne Scott Mahoney

William D Coggio

Hassan Sahouani

John Charles Clark

Kim Marie Vogel

Lan Hong Liu

Joan M Noyola

Paul B Armstrong

Chuntao Cao

Lian Soon Tan

Mary M Caruso Dailey

Phillip E Tuma

Sharon Wang

Andrew S Kuczma

Ying Lin

David A Kaisaki

Edward R Hauser

Heather K Kranz

Philip G Clark

Jason T Petrin

Jonathan W Kemling

L Charles Hardy

Luke E Heinzen

Nicholas L Untiedt

Rachel J Hobson

Alan G Hulme-Lowe

Alastair Stuart Dodds

Eric M Peterson

Harry E Johnson

Nicholas A Stacey

Jordan C DuCharme

Brian A Kubicek

Liping Claryn Ng

Namiko Ikegaya

Masakazu Hasegawa

Alistair S Dodds

Matthew J Pinnow

David K Johnson

Described herein is fluorinated dye comprising: a fluorescing coumarin-derived moiety connected to an oligomer of hexafluoropropylene oxide via a non-fluorinated divalent linking group. Such fluorinated dyes are soluble in fluorinated fluids and may be used to detect leaks in various systems such as refrigerant, air conditioning and/or heat transfer systems.

Fluorinated coumarins

A composition that includes a blend of a pressure sensitive adhesive and an ultraviolet light-absorbing oligomer. The oligomer has a first divalent unit having a pendent ultraviolet absorbing group and a second divalent unit represented by formula in which Ris hydrogen or methyl, and Ris alkyl having from 4 to 20 carbon atom. Articles including the composition are disclosed. For example, an assembly including a barrier film and the composition is also disclosed. 

Pressure sensitive adhesive composition including ultraviolet light-absorbing oligomer

A composition that includes a blend of a fluoropolymer and an ultraviolet light-absorbing oligomer. The oligomer has a first divalent unit having a pendent ultraviolet absorbing group and at least one of a second divalent unit that is non-fluorinated or a third divalent unit that is fluorinated. The pendent ultraviolet absorbing group can include a triazine group. The composition can be an extruded film. A method of making such an extruded film is also disclosed.

Fluoropolymer composition including an oligomer having an ultraviolet absorbing group

A copolymer that includes first divalent units having a pendent ultraviolet absorbing group, second divalent units represented by formula (I):, and third divalent units represented by formula (II):. Each Ris independently hydrogen or methyl; Ris a straight-chain or branched alkyl having from 1 to 20 carbon atoms; V is O or NH; W is alkylene having from 1 to 10 carbon atoms; and each R' is independently alkyl having from 1 to 6 carbon atoms. Compositions including the copolymer, for example, pressure sensitive adhesive compositions are disclosed. Articles including the compositions are disclosed. For example, an assembly including a barrier film and the pressure sensitive adhesive composition is also disclosed. 

Copolymer including ultraviolet light-absorbing group and compositions including the same

Composite particles are provided that can be used to cure epoxy resins. More particularly, the composite particles have a porous polymeric core particle, a curing agent and/or a curing catalyst for an epoxy resin positioned within the porous polymeric core particle, and a fluoropolymer-containing coating layer around the porous polymeric core particle. Additionally, curable compositions are provided that are mixtures containing an epoxy resin and the composite particles. The epoxy resin typically does not react until the curable composition is heated causing the release of the curing agent and/or curing catalyst from the composite particle. Further, cured compositions formed from the curable composition are provided.

Composite particles for curing epoxy resin compositions and curable and cured epoxy resin compositions prepared using the particles

Described herein is a polymer derived from

Fluorinated polymers comprising phosphonic moieties

A composition that includes a blend of a fluoropolymer and an ultraviolet light-absorbing oligomer. The oligomer has a first divalent unit having a pendent ultraviolet absorbing group and a second divalent unit represented by formula (I): At least one of the following limitations is also met: the ultraviolet light-absorbing oligomer further comprises a third divalent unit comprising a pendent 2,2,6,6-tetramethylpiperidinyl group, or the composition further comprises a second oligomer comprising a third divalent unit comprising a pendent 2,2,6,6-tetramethylpiperidinyl group at least one of the second divalent units. Articles including the composition are disclosed. The composition can be an extruded film. A method of making such an extruded film is also disclosed. 

Fluoropolymer composition including at least one oligomer

A composition includes a fluorinated or perfluorinated organic solvent, and a fluorinated surfactant of the general formula (1): [Formula should be inserted here] Rf is a perfluoroalkyl group having 1-6 carbon atoms. Each occurrence of Rand Ris independently H or CH, n is 1-3, and x is 1-3. 

Fluorinated surfactant containing compositions

Anionic surfactants have a formula:RSON(H)&#x2014;CHCH(CH)OH; orRSON(H)&#x2014;(CHCHO)H, whereis an integer from 2-6. Ris a fluoroalkyl group having 3 to 8 carbon atoms. Neutral surfactants having a formula:RSON[CHCH(CH)OH];&#x2003;&#x2003;(a)RSON[CHCH(CH)OH][(CHCHO)H], whereis an integer from 1-6;&#x2003;&#x2003;(b)RSON(R)[(CHCHO)H], whereis an integer from 2-6, and R is an alkyl group having 1 to 4 carbon atoms; or&#x2003;&#x2003;(c)RSON[(CHCHO)H][(CHCHO)H], whereis an integer from 1-6 andis an integer from 3-6. Ris a fluoroalkyl group having 3 to 8 carbon atoms.&#x2003;&#x2003;(d)

Surfactants and methods of making and using same

A thermoplastic copolymer that includes a first divalent unit having a pendent ultraviolet absorbing group and a second divalent unit that is fluorinated. A fluoropolymer composition including the thermoplastic copolymer is also disclosed.

Copolymers including ultraviolet absorbing groups and fluoropolymer compositions including them

A method of modifying a surface of a photoresist material including exposing the photoresist material to an aqueous ionic surfactant solution and varying the pH of the aqueous ionic surfactant solution until a fluorochemical layer is formed in or on the photoresist material. The aqueous ionic surfactant solution includes a perfluoroalkyl sulfonamide the formula: RS0NH&#x2014;R' where R=CF&#x2014; and n=1 to 6, R&#x2032;=&#x2014;H, &#x2014;CH, and &#x2014;CHCHOH. The aqueous ionic surfactant solution has a pH of within about 3 pH units of a pKa of the perfluoroalkyl sulfonamide.

Perfluoroalkyl sulfonamides surfactants for photoresist rinse solutions

Anionic surfactants have a formula: RSON(H)&#x2014;CHCH(CH)OH; or RSON(H)&#x2014;CHCHO)H, where x is an integer from 2-6. Rf is a fluoroalkyl group having 3 to 8 carbon atoms. Neutral surfactants having a formula: (a) R&#x2014;SON[CHCH(CH)OH]; (b) RSON[CHCH(CH)OH][(CHCHO)H], where n is an integer from 1-6; (c) RSON(R)[(CHCHO)H], where p is an integer from 2-6, and R is an alkyl group having 1 to 4 carbon atoms; or (d) RSON[(CHCHO)H][(CHCHO)H], where q is an integer from 1-6 and m is an integer from 3-6. Ris a fluoroalkyl group having 3 to 8 carbon atoms.

The disclosure relates to chemical mechanical planarization (CMP) polishing compositions including proline and a fluorochemical surfactant. The wafer polishing composition may be used as a solution substantially free of abrasive particles, the composition of which can be adjusted to control Oxide Removal Rate and oxide over nitride Selectivity Ratio in Shallow Trench Isolation (STI) processing of semiconductor wafers using a fixed abrasive CMP process. In certain embodiments, the disclosure provides a working liquid for fixed abrasive CMP including proline and a fluorochemical surfactant at a pH from 9 to 11. When used in a fixed abrasive CMP system and method for STI, exemplary working liquids may yield an Oxide Removal Rate of at least 500 angstroms per minute, and an oxide over nitride Selectivity Ratio of at least 5.

Chemical mechanical planarization composition, system, and method of use

A composition comprising a nonionic fluorinated polymeric surfactant having a weight average molecular weight of least 100,000 grams per mole, the nonionic fluorinated polymeric surfactant comprising: divalent units independently represented by formula (I): in a range from 30% to 65% by weight, based on the total weight of the nonionic fluorinated polymeric surfactant; and divalent units independently represented by formula (II): in a range from 70% to 35% by weight, based on the total weight of the nonionic fluorinated polymeric surfactant. Ris a perfluoroalkyl group having from 3 to 4 carbon atoms; R and Rare each independently hydrogen or alkyl of 1 to 4 carbon atoms; Ris alkyl of 16 to 24 carbon atoms; and n is an integer from 2 to 11. Foams comprising the nonionic fluorinated polymeric surfactant and a liquid hydrocarbon and methods of making and using the foams are also disclosed.

Fluorinated surfactants and methods of using the same

Growing community of inventors

Maplewood, MN, United States of America

Patricia M Savu