Saint-gobain Glass France

Sage Electrochromics, Inc.

Sanit-gobain Glass France

Pascal Reutler

Jean-Christophe Giron

Eric E Mattmann

Bryan D Greer

Svetoslav Tchakarov

Nicolas Nadaud

Didier Jousse

Rino Messere

Fabien Lienhart

Sylvain Belliot

Estelle Martin

Hadia Gerardin

Peter Bocek

Sebastian Marius Sarrach

Eric Petitjean

Pierre-Alain Gillet

Pascal Nael

Laurent Labrousse

Jeremiah Lawson

Jacob Siegert

Sean Murphy

Jonathan Schneider

Georges El Hitti

A non-light-emitting variable transmission device can include an active stack; a transparent conductive layer overlying the active stack; an antireflective layer overlying the transparent conductive layer and defining a hole; and a bus bar comprising a conductive tape that extends into the hole and contacts the transparent conductive layer. Proper selection of materials and design of a bus bar can allow an electrical connection to be made to the transparent conductive layer without the need to cut an underlying transparent conductive layer. A method of forming the non-light-emitting variable transmission device can include patterning the antireflective layer to define the hole that extends to the transparent conductive layer. Improved control in patterning allows the antireflective layer to be relatively thin and not remove too much of the underlying transparent conductive layer.

Non-light-emitting variable transmission device and a method of forming the same

A laminate can include a first panel and including a first transparent substrate having a first refractive index. The laminate can further include a second panel and a third panel, each coupled to the first panel. The second panel includes a second transparent substrate having a second refractive index, and the third panel includes a third transparent substrate having a third refractive index. The laminate can further include a fill material disposed within a gap between the second and third panels and having a fill material refractive index. The fill material refractive index is within 0.09 of the second refractive index, the third refractive index, or a value between the second and third refractive indices. Coupling may be direct or may be achieved with an adhesive film. The fill material can help to reduce the likelihood of seeing seams between the second and third panels.

Laminate including panels and a fill material between the panels

A glazing including an electrochromic component and a coating coupled to the electrochromic component. In an embodiment the coating includes a non-transparent element. In a further embodiment, the non-transparent element includes a plurality of non-transparent elements. In another aspect, a method of displaying an image includes providing an electrochromic component and a coating coupled to the electrochromic component and projecting the image onto the coating from a light emitting source.

Electrochromic components and methods associated therewith

The invention relates to a substrate (), especially a transparent glass substrate, provided with a thin-film multilayer comprising a functional layer () having reflection properties in the infrared and/or in solar radiation, especially a metallic functional layer based on silver or on a metal alloy containing silver, and two coatings (), said coatings being composed of a plurality of dielectric layers (), so that the functional layer () is placed between the two coatings (), the functional layer () being deposited on a wetting layer () itself deposited directly onto a subjacent coating (), characterized in that the subjacent coating () comprises at least one dielectric layer () based on nitride, especially on silicon nitride and/or aluminum nitride, and at least one noncrystalline smoothing layer () made from a mixed oxide, said smoothing layer () being in contact with said superjacent wetting layer ().

Substrate comprising a stack having thermal properties

The subject of the present invention is a multilayer electrode (), acid etching thereof and also organic light-emitting devices incorporating it. The multilayer electrode, known as a lower electrode for an organic light-emitting device (), successively comprises: &#x2014;a contact layer () based on a metal oxide and/or a metal nitride; a functional metallic layer () having intrinsic electrical conductivity properties; a thin blocking layer () directly on the functional layer, the layer comprising a metallic layer having a thickness less than or equal to 5 nm and/or a layer with a thickness less than or equal to 10 nm, which is based on a substoichiometric metal oxide, substoichiometric metal oxynitride or substoichiometric metal nitride; a coating comprising an overlayer based on a metal oxide () for adapting the work function.

Electrode for an organic light-emitting device, acid etching thereof and also organic light-emitting device incorporating it

The invention relates to a substrate (), provided with a thin-film multilayer comprising an alternation of n functional layers () having reflection properties in the infrared and/or in solar radiation and (n+1) coatings (), where n is an integer &#x2267;2, said coatings being composed of a plurality of dielectric layers (), so that each functional layer () is placed between two coatings (), at least two functional layers () each being deposited on a wetting layer () itself deposited respectively directly onto a subjacent coating (), characterized in that two subjacent coatings () each comprise at least one dielectric layer () and at least one noncrystalline smoothing layer () made from a material that is different from the material of said dielectric layer within each coating, said smoothing layer () being in contact with said superjacent wetting layer () and in that these two subjacent coatings () being of different thicknesses, the thickness of the smoothing layer () of the subjacent coating () that has a total thickness of less than that of the other subjacent coating () is less than or equal to the thickness of the smoothing layer () of this other subjacent coating ().

A substrate for an organic light-emitting device, especially a transparent glass substrate, which includes, on a first main face, a bottom electrode film, the electrode film being formed from a thin-film multilayer coating comprising, in succession, at least: a contact layer based on a metal oxide and/or a metal nitride; a metallic functional layer having an intrinsic electrical conductivity property; an overlayer based on the metal oxide and/or a metal nitride, especially for matching the work function of said electrode film, said substrate including a base layer, said base layer covering said main face.

Substrate for an organic light-emitting device, use and process for manufacturing this substrate, and organic light-emitting device

The subject of the invention is a substrate that can be used as a substrate for the epitaxial growth of layers based on gallium nitride and comprising a support material () coated on at least one of its faces with at least one multilayered stack comprising at least one zinc-oxide-based layer (). The substrate is coated with a semiconductor structure of III-N or II-VI type, and it is characterized in that placed between the support material () and said at least one zinc-oxide-based layer () is at least one intermediate layer () comprising oxides with at least two elements chosen from tin (Sn), zinc (Zn), indium (In), gallium (Ga) and antimony (Sb).

Substrate for the epitaxial growth of gallium nitride

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Paris, France

Pascal Reutler