Asml Netherlands B.v.

Pascal Antonius Smits

Martinus Cornelis Maria Verhagen

Marcel Beckers

Nicolas Alban Lallemant

David Theodorus Willy Van Der Plas

Stephan Koelink

Ronald Stultiens

Henk Krus

Arie Jeffrey Den Boef

Sander Frederik Wuister

Johannes Petrus Martinus Bernardus Vermeulen

Yvonne Wendela Kruijt-Stegeman

Andre Bernardus Jeunink

Catharinus De Schiffart

Wladimir Fransiscus Gerardus Maria Hertog

Wladimir Franciscus Gerardus Maria Hertog

A method of determining a position of a substrate relative to an imprint template is described, wherein the imprint template has at least three gratings and the substrate has at least three gratings positioned such that each imprint template grating forms a composite grating with an associated substrate grating, the at least three imprint template gratings and associated substrate gratings having offsets relative to one another. The method includes detecting an intensity of radiation which is reflected by the three composite gratings, and using the detected intensities to determine displacement of the substrate or imprint template from a position.

Imprint lithography

A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one gas generator for generating a conditioned gas flow. The gas generator includes a guiding element for guiding the gas flow to a lower volume generally located below a lower surface of the projection system and to a volume between the lower surface and the substrate. The guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to the lower surface.

Lithographic apparatus and device manufacturing method

Growing community of inventors

Genderen, Netherlands

Pascal Antonius Smits