Samsung Electronics Co., Ltd.

Park-Song Kim

Yu-sin Yang

Sang-Mun Chon

Sun-Yong Choi

Tae-Min Eom

Kwan-Woo Ryu

Chung-Sam Jun

Chung Sam Jun

An apparatus for measuring contamination of a semiconductor substrate includes a chuck for loading a substrate, a position detection means for recognizing a front surface of the loaded substrate to obtain position data of a portion of the substrate to be measured, a first driving part for moving the chuck in accordance with the position data to measure a rear portion of the substrate, and a surface measurement means disposed under the chuck for selectively measuring metal contamination of the substrate at the rear portion of the substrate. In operation, the substrate is loaded onto a chuck, position data of a portion of the substrate to be measured is obtained by recognizing patterns formed on the substrate, the substrate is then moved in accordance with the position data to measure a rear portion of the substrate, and metal contamination is selectively measured at the rear portion of the substrate.

Method and apparatus for measuring contamination of a semiconductor substrate

A method and apparatus for detecting contaminants in an ion-implanted wafer by annealing and activating the ion-implanted wafer by heating or charging or both, and measuring the thermal wave absorbance generated from the activated wafer.

Method and apparatus for detecting contaminants in ion-implanted wafer

Growing community of inventors

Gwangju, South Korea

Park-Song Kim