United Microelectronics Corp.

Suntek Compound Semiconductor Co., Ltd.

Pang-Miao Liu

Chieh-Te Chen

Kwang-Ming Lin

Tzu-Min Peng

Chi-Jui Chen

Chin-Tsai Hsu

A method of forming a gate structure includes forming sequentially a pad layer and a first photoresist layer over a substrate. A cross-linked surface layer is formed on the surface of the first photoresist layer, followed by rounding the profile of the first photoresist layer, and removing the exposed pad layer to expose the substrate. A second photoresist layer is formed over the first photoresist layer, wherein a portion of the first photoresist layer and the exposed substrate are exposed by the second photoresist layer. Thereafter, a conductive layer is formed, wherein the conductive layer formed on the second photoresist layer is separated from the conductive layer formed on the first photoresist layer and the exposed substrate. The first and the second photoresist layers are removed while the conductive layer on the second photoresist layer is concurrently being striped. The remaining conductive layer serves as a gate structure.

Gate structure forming method of field effect transistor

A method of fabricating a node contact opening is described. A dielectric layer is formed on a substrate. A first conductive layer is formed on the dielectric layer. The first conductive layer is etched to form a trapezoidally cross-sectioned opening exposing a portion of the dielectric layer. The dielectric layer exposed by the trapezoidally cross-sectioned opening is etched to form a node contact opening in the dielectric layer exposing a part the substrate. A second conductive layer is formed to fill the node contact opening and in contact with the conductive layer.

Method of fabricating a node contact

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Hsinchu Hsien, Taiwan

Pang-Miao Liu