Applied Materials, Inc.

Palash Joshi

David Walter Groechel

Li Wu

Shawyon Jafari

Chidambara A Ramalingam

Dorothea Buechel-Rimmel

Kirubanandan Naina Shanmugam

Subhaschandra Shreepad Salkod

Katty Guyomard

Moin Ahmed Khan

Avishek Ghosh

Exemplary semiconductor chamber component cleaning systems may include a receptacle. The receptacle may include a bottom lid that may be an annulus. The annulus may be characterized by an inner annular wall and an outer annular wall. A plurality of recessed annular ledges may be defined between the inner annular wall and the outer annular wall. Each recessed annular ledge of the plurality of recessed annular ledges may be formed at a different radial position along the bottom lid. The cleaning systems may include a top lid removably coupled with the bottom lid about an exterior region of the top lid. The cleaning systems may include a tank defining a volume to receive the receptacle.

Semiconductor chamber component cleaning systems

Growing community of inventors

Bengaluru, India

Palash Joshi