Canon Kabushiki Kaisha

Ozkan Ozturk

Seth J Bamesberger

Byung-Jin Choi

Masaki Saito

Se-Hyuk Im

Christopher Ellis Jones

Alireza Aghili

Mario Johannes Meissl

Steven C Shackleton

Nilabh Kumar Roy

An apparatus includes a first substrate chuck configured to hold a first substrate, a second substrate chuck configured to hold a second substrate, and a dispenser configured to dispense a formable material onto the first substrate while the first substrate overlies the first substrate chuck and to dispensing the formable material onto the second substrate while the second substrate overlies the second substrate chuck. A method of forming a planarization layer on a substrate can use the apparatus. A method of making an article can include the method of forming the planarization layer.

Apparatus including a substrate chuck, a dispenser, and a planarization head and methods of using the same

A superstrate for planarizing a substrate. The superstrate includes a body having a first side having a contact surface and a second side having a central portion and a peripheral portion surrounding the central portion. The peripheral portion includes a recessed region.

Planarization apparatus, planarization process, and method of manufacturing an article

A planarization apparatus comprising a superstrate chuck is provided. The superstrate includes a plurality of inner lands protruding from a surface of the superstrate chuck and a peripheral land protruding from the surface of the superstrate chuck along a periphery of the superstrate chuck and encircling the inner lands therein. The peripheral land has a height smaller than a height of each of the inner lands. The peripheral land has a width sufficiently larger than a width of each of the inner lands such that a pressure leakage through the peripheral land is controlled to be less than a threshold.

Planarization process, apparatus and method of manufacturing an article

A chuck for retaining a superstrate or a template. The chuck comprises a geometric structure formed on a surface of the chuck. The geometric structure includes at least one of a rounded edge portion and a roughened surface portion, such that an intensity variation of light transmitting through the geometric structure and an area of the chuck adjacent to the geometric structure is reduced.

Superstrate chuck, method of use, and method of manufacturing an article

A method, comprising retaining a superstrate with a superstrate chuck; applying a pressure to deflect the superstrate toward a substrate, deflection of the superstrate being gradually extended along a radial direction; maintaining a vacuum applied to a perimeter of the superstrate and continuously retaining the superstrate with the chuck while the deflecting the superstrate by the pressure; releasing the vacuum from the perimeter of the superstrate; and releasing the superstrate from the chuck.

A method is provided, comprising creating at least one crack at a point on an edge of a stack of at least a substrate and a superstrate; propagating the crack along the periphery; and moving the superstrate relative to the substrate to complete separation of the superstrate from the substrate.

An apparatus may include a superstrate. The superstrate can include a body having a diameter. The body may fit within a projected square. The projected square may have a length equal to the diameter of the body. The body within the projected square may produce an open area between an exterior edge of the body and the projected square. The superstrate may further include a first projection extending from the exterior edge of the body within the open area.

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Round Rock, TX, United States of America

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