Applied Materials Israel Limited

Oz Fox-kahana

Yan Avniel

Bobin Mathew Skaria

Gal Daniel Gutterman

Atai Baldinger

Murad Muslimany

David Uliel

Erez Lidor

There is provided a system and method of examination of a semiconductor specimen, comprising: obtaining a sequence of frames of an area of the specimen acquired by an electron beam tool configured to scan the area from a plurality of directions, the sequence comprising a plurality of sets of frames each acquired from a respective direction; and registering the plurality of sets of frames and generating an image of the specimen based on result of the registration, comprising: performing, for each direction, a first registration among the set of frames acquired therefrom, and combining the registered set of frames to generate a first composite frame, giving rise to a plurality of first composite frames respectively corresponding to the plurality of directions; and performing a second registration among the plurality of first composite frames, and combining the registered plurality of first composite frames to generate the image of the specimen.

Image generation for examination of a semiconductor specimen

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Rehovot, Israel

Oz Fox-kahana