Asahi Glass Company, Limited

Mitsubishi Denki Kabushiki Kaisha

Nippon Steel Corporation

Asahi Glass Ceramics Co., Ltd.

Otojiro Kida

Eri Suzuki

Akira Mitsui

Atsushi Hayashi

Hisashi Osaki

Yutaka Segawa

Toshihiro Ishino

Yasushi Ono

Hiroshi Taketsugu

Koji Nakamura

Kenichi Sasaki

Takuji Oyama

Tsunehiko Sugawara

Nobuhiro Shinohara

Yoshihisa Beppu

Makoto Ishizuka

Yoshiaki Shia

Shunichi Igeta

Hideaki Mori

A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MO as the main component, wherein MO is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

Target and process for its production, and method of forming a film having a high refractive index

Target and process for its production, and method for forming a film having a high refractive index

A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MO,as the main component, wherein MO,is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

Target and process for its production, and method for forming a film having a highly refractive index

A monolithic refractory composition, which can be rapidly dried after being mixed with water and applied to a desired portion by casting or spraying to form a furnace wall, and which comprises refractory aggregates, a refractory powder, an aluminum alloy powder and a dispersant, wherein the aluminum alloy powder is contained in an amount of from 0.04 to 5 parts by weight per 100 parts by weight of the total amount of the refractory aggregates and the refractory powder.

Process for forming a furnace wall

Monolithic refractory composition wall

An electrification removing component comprising:

Electrification removing component

A flat cathode-ray tube in which a ceramics film or a glass film is formed by thermal spray on the coupled surface of a metal case. This assembly and a glass screen are coupled through crystallized frit glass or by glass fusion. The coupling between the metal case and the glass screen has a coupling strength sufficient to resist the vacuum stress. The metal case, which is not exposed for a long time to high temperatures during thermal spraying, can be made of a metal for realizing a lightweight without any thermal deformation or dimensional variations, thereby attaining satisfactory mechanical properties.

Flat cathode-ray tube

High zirconia fused cast refractories which include as chemical components of refractories in weight %, 85 through 91% of ZrO.sub.2, 7.0 through 11.2% of SiO.sub.2, 0.85 through 3.0% of Al.sub.2 O.sub.3, 0.05 through 1.0% of P.sub.2 O.sub.5, 0.05 through 1.0% of B.sub.2 O.sub.3 and 0.01 through 0.12% of a summed amount of K.sub.2 O and Na.sub.2 O, wherein the weight % of K.sub.2 O is not smaller than the weight % of Na.sub.2 O.

High zirconia fused cast refractories

A ceramics rotatable magnetron sputtering cathode target comprising a cylindrical target holder and a ceramics layer as a target to be sputtered, formed on the outer surface of the target holder, wherein at least one layer selected from the group consisting of a layer of a metal or alloy having a thermal expansion coefficient of an intermediate level between the thermal expansion coefficients of the ceramics layer and the target holder, and a layer of a metal or alloy having a thermal expansion coefficient approximating to the thermal expansion coefficient of the ceramics layer, is formed as an undercoat between the ceramics layer and the target holder.

Ceramic rotatable magnetron sputtering cathode target and process for

A high zirconia fused cast refractory which comprises from 90 to 95% by weight of ZrO.sub.2, from 3.5 to 7% by weight of SiO.sub.2, from 1.2 to 3% by weight of Al.sub.2 O.sub.3 and from 0.1 to 0.35% by weight in a total amount of Na.sub.2 O and/or K.sub.2 O, and which does not substantially contain any one of P.sub.2 O.sub.5, B.sub.2 O.sub.3 and CuO.

High zirconia fused cast refractory

Thermocouple temperature sensor and a method of measuring the

The service life of a bottom electrode for a direct current arc furnace for producing steel is prolonged by using ZrB.sub.2 type sintered bodies for a contacting pins which constitutes a major part of the bottom electrode wherein the ZrB.sub.2 type sintered bodies have a corrosion-resistance to molten steel and slag. Further, the number of contacting pins to be used is reduced by forming each of the pins into a form of pillar with a through hole at the axis, or by assembling a plurality of longitudinally divided pin portions to form a contacting pin, whereby the diameter of the contacting pin can be made large. Then the space between contacting pins is made broad, and brick having good corrosion-resistance are filled in the space so that the service life of the bottom electrode is brought closer to that of the refractory lining of the direct current arc furnace.

Bottom electrode for a direct current arc furnace

A ZrB.sub.2 composite sintered material consisting essentially of at least 1% by weight of SiC, at least 1% by weight of BN, at most 20% by weight of AlN, at most 20% by weight of B.sub.4 C, the rest being substantially ZrB.sub.2, provided that the total amount of SiC and BN is from 2 to 50% by weight.

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Yokohama, Japan

Otojiro Kida