Oerlikon Surface Solutions Ag, Pfaffikon

Oc Oerlikon Balzers Ag

Unaxis-Balzers Aktiengesellschaft

Unaxis Balzers Aktinegesellschaft

Oerlikon Trading Ag, Trubbach

Othmar Zueger

Beno Widrig

Helmut Rudigier

Juergen Ramm

Mathias Maier

Michael John Milbourne

A method of forming a coating for deposition to non-metallic surfaces comprises the steps of applying () a semiconductor material to a substrate to form a semiconductor material layer and simultaneously or subsequently applying () metallic material or additional semiconductor material. The metallic material or additional semiconductor material is introduced into the semiconductor material layer in a targeted manner to tailor the optical properties of the coating.

Method for producing a coating

The present invention relates to a curing device for applying UV radiation to substrates, comprising at least one radiation source, at least one reflector member surrounding the radiation source, at least two divided dichroic mirror members opposite to the radiation source, which largely transmit the VIS & IR content of the radiation source and keep it away from the processing zone and at the same time largely reflect the UV content of the radiation source in the direction of the processing zone, at least one optical disk member that separates the cooling gas flow in the exposure device from the processing zone, and which is characterized in that the at least two divided dichroic mirror members are arranged in such a manner that they are separate from one another and offset from one another in the direction of the main beam and are displaced parallel to the main beam and thus opaque to the main beam, so that cooling gas can flow out through the openings created, but intensity loss of the UV radiation does not occur.

UV curing device with divided UV reflecting mirrors

Component surfaces are coated with thermally stable layers. In particular infrared mirror surfaces or surfaces of combustion chambers are coated with at least one layer consisting of thermally stable Al&#x2014;Cr&#x2014;O in such a manner that the absorption, reflection or transmission of infrared radiations (hereinafter also called thermal radiations) is influenced.

Infrared mirror with a thermally stable layer

An in-situ process-monitoring device for measuring a curing state of components coated with a UV-curable lacquer. The device includes at least one radiation source for curing the lacquer, as well as at least one signal source and at least one spectrometer for measuring radiation of the signal source reflected from the components, in order to determine the curing state. The measuring is carried out in a contactless manner, and the at least one signal source for the measuring is identical to the at least one radiation source for the curing.

Process monitoring for UV curing

The magnetron sputtering source comprises a target mount for mounting a target arrangement comprising a sputtering target having a sputtering surface; a primary magnet arrangement for generating close to said sputtering surface a magnetron magnetic field describing one tunnel-like closed loop having an arc-shaped cross-section; a secondary magnet arrangement for generating close to said sputtering surface an auxiliary magnetic field having a substantially arc-shaped cross-section, said auxiliary magnetic field superposing with said magnetron magnetic field and being substantially inversely polarized with respect to said magnetron magnetic field; and an adjustment unit for adjusting said auxiliary magnetic field. The vacuum treatment apparatus comprises such a magnetron sputtering source. The method for manufacturing coated substrates by magnetron sputtering using a magnetron sputtering source comprises the steps of a) generating close to a sputtering surface of a target said magnetron magnetic field; b) generating close to said sputtering surface said auxiliary magnetic field; and c) adjusting said auxiliary magnetic field. In particular, said secondary magnet arrangement comprises several separately adjustable segments. Using the invention, it is possible to determine gauge functions for precisely achieving target thickness distributions.

Magnetron sputtering source and arrangement with adjustable secondary magnet arrangement

A method for dividing substantially nonpolarized white light into three substantially nonpolarized fractions includes splitting the substantially nonpolarized white light into a first fraction and a second fraction, the first fraction being substantially nonpolarized light of a first wavelength interval and the second fraction of substantially nonpolarized light of a second and a third wavelength interval, the first wavelength interval being located between the second and the third wavelength interval and splitting the second fraction into a third fraction with substantially nonpolarized light of the second wavelength interval and into a fourth fraction with substantially nonpolarized light of the third wavelength interval.

Method for combination of light of different wavelengths

The present invention relates to a method for combining or for splitting the beam paths of substantially nonpolarized light of at least three different wavelength intervals. The splitting or the combining of the beam path of light of those wavelength intervals located between the other wavelength intervals takes place when the beam paths of the light of the two other wavelength intervals are already or still combined. The present invention also relates to an illumination unit comprising a white light source and utilizing this method by means of interference filters for splitting the white light into red, blue and green light beams. The invention also relates to an illumination unit comprising a red, green and blue light source and utilizing these methods by means of interference filters for the combination of the beam paths of the light sources.

Device for combination of light of different wavelengths

A process is disclosed for manufacturing coated substantially plane workpieces, in which the workpieces are guided to a vacuum treatment area guided by a control. The treatment atmosphere is modulated in the treatment area as a function of workpiece position with the defined profile. The system and process can be used to deposit defined layer thickness distribution profiles on substrates in a reactive coating.

Vacuum treatment system and process for manufacturing workpieces

A vacuum treatment system has a vacuum treatment chamber, has an ACTUAL value sensor to establish a treatment atmosphere in the form of a regulating element of a control circuit. The treatment atmosphere in the treatment area is modulated according to a defined profile as a function of the workpiece carrier position. The system and process deposits defined layer thickness distribution profiles on substrates in a reactive coating.

A vacuum treatment system has a vacuum treatment chamber, with a sensor arrangement to detect the treatment atmosphere momentarily existing in the treatment area. An ACTUAL value sensor of the sensor arrangement for one or more of the elements to establish a treatment atmosphere is a regulating element of a control circuit for the treatment atmosphere in the treatment area. A workpiece carrier is drivably movable in the chamber through the treatment area having the treatment atmosphere. At least one of the elements modulates the treatment atmosphere in the treatment area according to a defined profile as a function of the workpiece carrier position. A process is disclosed for manufacturing workpieces, in which the workpieces are guided to a vacuum treatment area guided by a control. The treatment atmosphere is modulated in the treatment area as a function of workpiece position with the defined profile. The system and process can be used to deposit defined layer thickness distribution profiles on substrates in a reactive coating.

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Triesen, Liechtenstein

Othmar Zueger