Asml Netherlands B.v.

Fei Comapny

Technische Universiteit Eindhoven

Otger Jan Luiten

Vadim Yevgenyevich Banine

Erik Roelof Loopstra

Pieter Willem Herman De Jager

Andrey Alexandrovich Nikipelov

Han-Kwang Nienhuys

Wouter Joep Engelen

Erik René Kieft

Petrus Henricus Antonius Mutsaers

Alexander Henstra

Gosse Charles De Vries

Olav Waldemar Vladimir Frijns

Borgert Kruizinga

Johannes Antonius Gerardus Akkermans

Gerrit Jacobus Hendrik Brussaard

Rilpho Ludovicus Donker

Leonardus Adrianus Gerardus Grimminck

Willem Jakobus Cornelis Koppert

Jasper Frans Mathijs Van Rens

Fredericus Bernardus Kiewiet

Wouter Verhoeven

Ruud Martinus Van Der Horst

Vladimir Litvinenko

Adam Christopher Lassise

Job Beckers

Edgar Jan Dirk Vredenbregt

Jim Gerardus Hubertus Franssen

Pieter De Jager

Leonardus Grimminck

Johannes Akkermans

Olav Frijns

A device for generating soft x-rays includes an electron source configured to generate an electron beam comprising electron micro-bunches; an electron accelerator configured to accelerate the electron micro-bunches from the electron source; and a laser configured to generate a laser beam () colliding with the accelerated electron micro-bunches () in a counterpropagating direction to generate the soft x-rays by inverse Compton scattering. The electron source has a magneto-optical trap configured to produce an ultracold atomic gas; two counterpropagating excitation laser beams configured to produce a standing wave for inducing a periodic spatial modulation of the ultracold atomic gas along a beam propagation direction; and an ionization laser configured to induce photo-ionization of the ultracold atomic gas.

Tunable source of intense, narrowband, fully coherent, soft X-rays

A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.

Radiation sensor apparatus

A method of patterning lithographic substrates, the method including using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

Lithographic method

In one aspect, the present invention provides a method of generating an electron beam in a transmission electron microscopy device. The method includes: generating an electron pulse [] by a pulsed electron source [], accelerating the electron pulse in a first resonant microwave cavity [], passing the accelerated electron pulse through a drift space [], and correcting the energy spread of the accelerated electron pulse in a second resonant microwave cavity [] by operating it out of phase by 90 degrees from the first resonant cavity [

Electron beam generation for transmission electron microscope

An apparatus for performing charged particle spectroscopy, comprising:

Time-of-flight charged particle spectroscopy

A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.

The invention relates to a charged-particle microscope comprising The beam pulsing device comprises a unitary resonant cavity disposed about a particle-optical axis and has an entrance aperture and an exit aperture for the beam. The resonant cavity is configured to simultaneously produce a first oscillatory deflection of the beam at a first frequency in a first direction and a second oscillatory deflection of the beam at a second, different frequency in a second, different direction. The resonant cavity may have an elongated (e.g. rectangular or elliptical) cross-section, with a long axis parallel to said first direction and a short axis parallel to said second direction.

Beam pulsing device for use in charged-particle microscopy

Growing community of inventors

Eindhoven, Netherlands

Otger Jan Luiten