Lam Research Corporation

Government of the United States of America, As Represented by the Secretary of Commerce

Osman Sorkhabi

Jin Zhang

Ye Feng

Yan Zhang

William Dean Thompson

Wenli Wu

Regis Joseph Kline

Xiaoshu Chen

Daniel F Sunday

A metrology system may include an optical metrology tool configured to produce an optical metrology output for one or more features on a processed substrate, and a metrology machine learning model that has been trained using a training set of (i) profiles, critical dimensions, and/or contours for a plurality of features, and (ii) optical metrology outputs for the plurality of features. The metrology machine learning model may be configured to: receive the optical metrology output from the optical metrology tool; and output the profile, critical dimension, and/or contour of the one or more features on the processed substrate.

Optical metrology in machine learning to characterize features

Provided herein are methods and apparatus for characterizing high aspect ratio (HAR) structures of fabricated or partially fabricated semiconductor devices. The methods involve using small angle X-ray scattering (SAXS) to determine average parameters of an array of HAR structures. In some implementations, SAXS is used to analyze symmetry of HAR structures in a sample and may be referred to as tilted structural symmetry analysis-SAXS (TSSA-SAXS) or TSSA. Analysis of parameters such as tilt, sidewall angle, bowing, and the presence of multiple tilts in HAR structures may be performed.

Determining tilt angle in patterned arrays of high aspect-ratio structures by small-angle x-ray scattering

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Danville, CA, United States of America

Osman Sorkhabi