Excillum Ab

Cymer, Inc.

Jettec Ab

Jmar Technologies, Inc.

Jmar LLC

University of California

Colorado State University Research Foundation

Oscar Hemberg

Tomi Tuohimaa

J Martin Algots

Alexander Bykanov

William N Partlo

Igor Vladimirovich Fomenkov

Alexander Igorevich Ershov

Richard L Sandstrom

John Andrew Adams

Scott Harris Bloom

Hans Martin Hertz

Kristina M Crousore

Brett A Spivey

Oleh V Khodykin

Victor J Chan

John Jeffrey Lyon

Joseph S Gottlieb

Mikael Otendal

Dennis W Cobb

Björn Sundman

Georgiy Olegovich Vaschenko

Norbert R Bowering

Jorge J Rocca

Per Takman

William G Oldham

William F Marx

Carmen Menoni

Cherish K Teters

Lars Rymell

Magnus Berglund

Erik H Anderson

Tae H Chung

Weilun Chao

Björn Hansson

Mikaél Otendal

Björn A M Hansson

A technique for indirectly measuring the degree of alignment of a beam in an electron-optical system including aligning means, focusing means and deflection means. To carry out the measurements, a simple sensor may be used, even a single-element sensor, provided it has a well-defined spatial extent. When practiced in connection with an X-ray source which is operable to produce an X-ray target, further, a technique for determining and controlling a width of an electron-beam at its intersection point with the target.

Aligning and focusing an electron beam in an X-ray source

In an electron irradiation system, a gas-tight housing encloses a cathode region and an irradiation region, which communicate through at least an aperture. In the cathode region, there is arranged a high-voltage cathode for emitting an electron beam. In the irradiation region, there is an irradiation site arranged to accommodate a stationary or moving object to be irradiated. The migration of cathode-degrading debris is limited by means of an electric field designed to prevent positively charged particles from entering the cathode region via the aperture. The invention can be embodied with an axial electric field, which realizes an energy threshold, or a transversal field which deflects charged particles away from trajectories leading into the cathode region.

Limiting migration of target material

Closed-loop circulation for providing liquid metal to an interaction region at which an electron beam is to impact upon the liquid metal to produce X-rays is presented. In a method, the pressure of the liquid metal is raised to at least 10 bar using a high-pressure pump. The pressurized liquid metal is then conducted to a nozzle and ejected into a vacuum chamber in the form of a spatially continuous jet. After passage through the vacuum chamber, the liquid metal is collected in a collection reservoir, and the pressure of the liquid metal is raised to an inlet pressure, e.g. using a primer pump, suitable for the inlet of the high-pressure pump. Also, a corresponding circulation system and an X-ray source provided with such circulation system.

Supply of a liquid-metal target in X-ray generation

An X-ray window includes a primary and a secondary window element. In order to evaporate debris by ohmic heating, current flows through the secondary (upstream) window element. Meanwhile, electric charge originating from electron irradiation and/or depositing charged particles is to be drained off the secondary window element via a charge-drain layer. To prevent large debris particles from short-circuiting the secondary window element, the current for heating the window element flows through heating circuitry which is electrically insulated from the charge-drain layer.

Coated X-ray window

An X-ray window including a primary and a secondary window element. In order to evaporate debris by ohmic heating, current flows through the secondary (upstream) window element. Meanwhile, electric charge originating from electron irradiation and/or depositing charged particles is to be drained off the window element. To prevent large debris particles from short-circuiting the window element and changing the desired heating pattern, the current for heating the window element flows through a layer which is insulated from the charge-drain layer.

Closed-loop circulation for providing liquid metal to an interaction region at which an electron beam is to impact upon the liquid metal to produce X-rays is presented. In a method according to the invention, the pressure of the liquid metal is raised to at least 10 bar using a high-pressure pump. The pressurized liquid metal is then conducted to a nozzle and ejected into a vacuum chamber in the form of a spatially continuous jet. After passage through the vacuum chamber, the liquid metal is collected in a collection reservoir, and the pressure of the liquid metal is raised to an inlet pressure, e.g. using a primer pump, suitable for the inlet of the high-pressure pump. The invention also relates to a corresponding circulation system and an X-ray source provided with such circulation system.

A self-cleaning X-ray window arrangement is provided that includes a primary X-ray-transparent window element, separating an ambient pressure region from an intermediate region, and a secondary X-ray-transparent window element, separating the intermediate region from a reduced pressure region. A contaminant is expected to deposit on a side of the secondary element facing the reduced pressure region. A heat source is adapted to heat a portion of the secondary window element thereby evaporating contaminant. The secondary element shields the primary element from the reduced pressure region, in which contaminant is present, whereas the pressure-tight primary window element carries most of the differential pressure between the ambient pressure region and the reduced pressure region. Several features help to decrease the rate at which contaminant enters the intermediate region. By maintaining the pressure in the intermediate region close to the reduced pressure, the mechanical stress on the secondary window element can be limited as well as the exposure to harmful gases.

X-ray window

A particle detection system uses a reflective optic comprising a curved surface to detect high angle scattered light generated by a particle in a liquid medium, when a laser beam is incident on the particle. When the particles transit the laser beam, light is scattered in all directions and is described by MIE scattering theory for particles about the size of the wavelength of light and larger or Rayleigh Scattering when the particles are smaller than the wavelength of light. By using the reflective optic, the scattered light can be detected over angles that are greater than normally obtainable.

Systems and methods for a multiple angle light scattering (MALS) instrument having two-dimensional detector array

A method and apparatus that may comprise an EUV light producing mechanism utilizing an EUV plasma source material comprising a material that will form an etching compound, which plasma source material produces EUV light in a band around a selected center wavelength comprising: an EUV plasma generation chamber; an EUV light collector contained within the chamber having a reflective surface containing at least one layer comprising a material that does not form an etching compound and/or forms a compound layer that does not significantly reduce the reflectivity of the reflective surface in the band; an etchant source gas contained within the chamber comprising an etchant source material with which the plasma source material forms an etching compound, which etching compound has a vapor pressure that will allow etching of the etching compound from the reflective surface. The etchant source material may comprises a halogen or halogen compound. The etchant source material may be selected based upon the etching being stimulated in the presence of photons of EUV light and/or DUV light and/or any excited energetic photons with sufficient energy to stimulate the etching of the plasma source material. The apparatus may further comprise an etching stimulation plasma generator providing an etching stimulation plasma in the working vicinity of the reflective surface; and the etchant source material may be selected based upon the etching being stimulated by an etching stimulation plasma. There may also be an ion accelerator accelerating ions toward the reflective surface. The ions may comprise etchant source material. The apparatus and method may comprise a part of an EUV production subsystem with an optical element to be etched of plasma source material.

EUV collector debris management

Ablation of holes having diameters as small as 82 nm and having clean walls was obtained in a poly(methyl methacrylate) on a silicon substrate by focusing pulses from a Ne-like Ar, 46.9 nm wavelength, capillary-discharge laser using a freestanding Fresnel zone plate diffracting into third order is described. Spectroscopic analysis of light from the ablation has also been performed. These results demonstrate the use of focused coherent EUV/SXR light for the direct nanoscale patterning of materials.

Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light

An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.

Method and apparatus for EUV plasma source target delivery

An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing optical element having a first range of operating center wavelengths; a droplet detection radiation source having a second range of operating center wavelengths; a drive laser steering element comprising a material that is highly reflective within at least some part of the first range of wavelengths and highly transmissive within at least some part of the second range of center wavelengths; a droplet detection radiation aiming mechanism directing the droplet detection radiation through the drive laser steering element and the lens to focus at a selected droplet detection position intermediate the droplet generator and the irradiation site.

LPP EUV plasma source material target delivery system

A particle detection system to identify and classify particles is programmed to capture digitized images of the particle generated by directing a light source through a fluid that includes the particle. The particle scatters the light and the scattered light is detected using a detector. The detector creates a digital signal corresponding to the particle, which is used by the system to generate biological optical signal. This biological optical signal can then be used to classify the event, or particle.

Systems and methods for detection and classification of waterborne particles using a multiple angle light scattering (MALS) instrument

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Stockholm, Sweden

Oscar Hemberg