Hitachi, Ltd.

Osamu Satou

Masao Sakata

Seiji Ishikawa

Yuzo Taniguchi

Sadao Shimoyashiro

Kazuhiko Matsuoka

Hiroto Nagatomo

Isao Miyazaki

Jun Nakazato

Kimio Muramatsu

Yuichi Ohyama

Yuzaburo Sakamoto

Shuichi Hanashima

Tsutomu Okabe

Taizo Hashimoto

Yutaka Ebara

Toshiaki Kobari

Yasushi Nakaizumi

Akimitsu Okura

Yasuhiko Ishida

Minoru Hiroki

Hideiti Kimura

The present invention provides data analysis stations respectively for a probing tester and an automatic particle inspection machine. And, in the data analysis station, the coordinates on which the disposition of the chips are described on a product basis are equal to those on which the locations of the defects are described. Further, the station provides a function of determining which of the chips each defect belongs to. These data analysis stations are connected through a communication line. The present invention is capable of analyzing the data on a chip basis, resulting in being able to grasp the relation between how the defects are caused on each chip and the product character of the chip.

Inspection data analyzing system

The present invention provides data analysis stations respectively for a probing tester and an automatic particle inspection machine. And in the data analysis station, the coordinates on which the disposition of the chips are described on a product basis are equal to those on which the locations of the defects are described. Further, the station provides a function of determining which of the chips each defect belongs to. These data analysis stations are connected through a communication line. The present invention is capable of analyzing the data on a chip basis, resulting in being able to grasp the relation between how the defects are caused on each chip and the product character of the chip.

Inspection system and method using separate processors for processing different information regarding a workpiece such as an electronic device

A vacuum container is evacuated to be kept at an ultra-high vacuum. Valve means is provided for connecting and disconnecting the inside of the vacuum container with and from the outside thereof, and includes a vacuum-tight seal made of a high polymer having a water absorptivity of 0.1% and less and an outgassing rate of 2.times.10.sup.-6 (Torr.multidot.l/sec/cm.sup.2 :at 200.degree. C.) and less.

Ultra-high vacuum apparatus

Growing community of inventors

Koganei, Japan

Osamu Satou