Omron Corporation

Osamu Nishizaki

Shigeru Aoyama

Kazuki Kasai

Yoshikazu Mori

Sayaka Naito

Gouo Kurata

Hiroyuki Miyamoto

Takeshi Kurahashi

Keiji Kobayashi

The present invention provides a contact determination device, control device, contact determination system, contact determination method, and contact determination program. This contact determination device acquires position information and/or posture information for a target person. Further, the state of movement of a part to be calculated in the body of the target person is calculated on the basis of acquired movement information and a body model relating to the shape of the body of the target person, said body model having been recorded in advance. Meanwhile, an electrical change is detected. Then, the contact determination device determines the state of contact between the target person and the object to be controlled on the basis of the detected electrical change and the state of movement of the part to be calculated in the body of the target person.

Contact determination device, control device, contact determination system, contact determination method, and non-transitory computer-readable recording medium

This work region estimation device, which estimates a region in which a worker performs work, is provided with an orientation acquisition unit that acquires worker orientation information, and a work region calculation unit that, on the basis of the orientation information and a worker body model, calculates a region in which a worker operation is forecast.

Work region estimation device, control device, control system, work region estimation method, and non-transitory computer-readable recording medium

This work region estimation device, which estimates a region in which a worker performs work, is provided with: a first operation acquisition unit that acquires worker operation information; an orientation acquisition unit that acquires worker orientation information; and a work region calculation unit that, on the basis of the operation information, the orientation information, and a worker body model, calculates a region in which a worker operation is forecast.

A lens array substrate and an image displaying device which can prevent unstable operation and malfunction of the TFTs by suppressing the rise in the temperature of liquid crystal display panel are provided. According to the invention, a lens resin layer and a sealing resin layer are provided on the glass substrate, and a lens array is formed at the interface of the lens resin layer and the sealing resin layer which have different refractive indexes from each other. On a cover substrate provided on the sealing resin layer, a light blocking member comprising a material with high reflectance such as Al and Ag is formed along the region corresponding to the boundary edges between the lenses in the lens array, then, a transparent electrode is formed on the all surface of the cover substrate via the light blocking member.

Lens array substrate and liquid crystal display apparatus

In a liquid crystal display device having an optical low-pass filter provided on a display screen, the optical low-pass filter is fixed to a liquid-crystal panel or a polarizing plate through a bonding layer having a refractive index different from the refractive index of the optical low-pass filter in a state where a surface having an optical function of the optical low-pass filter is directed toward a liquid-crystal panel or the polarizing plate. Further, in a liquid crystal display device having a phase plate, an optical low-pass filter is integrally formed on a phase plate. The occurrence of rainbow-shaped interference fringes is prevented. A liquid crystal display device is miniaturized and the number of components thereof is reduced. The fabrication precision of an optical low-pass filter is improved.

Dot matrix-type display device with optical low-pass filter fixed to a

A mother layer made of a thermoplastic resin is formed on the substrate. The mother layer is etched to make a grating layer. The etching process is stopped so that an offset layer remains under the grating layer. The grating layer and the offset layer are baked to be molten. The baking process is stopped when a phase grating defined by a surface having a sinusoidal shape is formed.

Method of manufacturing optical low-pass filter

A microlens array including a plurality of spaced apart individual microlens in a plane defining a plurality of spaced apart apertures through the plane. The use of non-circular apertures in a preferred embodiment greatly increases the effective lens ration. This microlens array provides a dust-resistant optical element, and reduces the probability of flat spots resulting from an AR coating and problem associated with the edge effect resulting from electrolytic plating.

Growing community of inventors

Nara, Japan

Osamu Nishizaki