Hitachi-Kokusai Electric Inc.

Kokusai Electric Corporation

Kokusai Eletric Corporation

Osamu Morita

Tomoshi Taniyama

Kenji Kameda

Masakazu Shimada

Yukinori Aburatani

Takashi Nogami

Daigi Kamimura

Yasuaki Komae

Toshiro Koshimaki

Shigeru Odake

Kaori Inoshima

Shinichiro Mori

Hiroyuki Mitsui

Hiroshi Ekko

Kazuo Nakaya

Susumu Nishiura

Hiroyuki Kitamoto

Yuji Yamaoka

Shuichi Kubo

There is provided an apparatus including a substrate holder to hold substrates including a product substrate and a dummy substrate, a transfer mechanism that loads the substrates into the substrate holder, a storage part to store a device parameter including at least the number of substrates that can be loaded on the substrate holder and the number of product substrates to be loaded on the substrate holder, and a controller to: (1) create substrate transfer data, which includes information indicating an order for transferring the substrates, transfer source information, and transfer destination information, according to the device parameter, (2) read the created substrate transfer data, (3) by transferring the substrates to the transfer mechanism based on the read substrate transfer data, transfer the dummy substrate to a substrate holding region except for a heat equalization region, and transfer the product substrate to the heat equalization region on the substrate holder.

Substrate processing apparatus and recording medium

According to one aspect of the present disclosure, there is provided a cleaning method including: cleaning a component in which a deposit adhering to the component constituting an apparatus is removed by supplying and discharging a cleaning gas, wherein the act of cleaning includes controlling the apparatus so that a signal, which indicates a concentration of a predetermined gas generated by a reaction of the deposit and the cleaning gas, reaches a predetermined upper limit value or less and then stays within a range between the predetermined upper limit value and a predetermined lower limit value for a predetermined time period.

Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, recording medium, and cleaning completion determining method

An apparatus and method capable of reducing the footprint of substrate processing system. An apparatus includes a housing chamber including a housing cabinet which houses housing containers for housing substrates, and a housing container carrying mechanism provided on the ceiling of the housing chamber and configured to carry the housing containers.

Substrate processing apparatus, method for manufacturing semiconductor device, and non-transitory computer-readable recording medium

Provided is a method of automatically setting, in a recipe, a process parameter (PP) according to the number of substrates to be processed. The method includes (a) displaying a process parameter of a process recipe on a display unit; (b) displaying a parameter name in a process parameter file on the display unit; (c) generating a first recipe by substituting the process parameter with the parameter name; (d) downloading the first recipe and one of a plurality of condition tables corresponding to the selected number of substrates when the number of substrates to be processed in a processing chamber is selected; and (e) generating a second recipe by substituting the process parameter of the downloaded one of the condition tables for the parameter name in the downloaded first recipe.

Substrate processing apparatus, method of manufacturing semiconductor device, and method of generating recipe

A substrate processing apparatus suppresses vibration of a cover when unloading a boat from a process pipe. The apparatus comprises a boat for placing a substrate, a process pipe configured to accommodate the boat, a cover having the boat placed thereon, the cover configured to open and close a furnace port installed on a lower end of the process pipe, a motor to drive an elevation mechanism which moves the cover upward and downward, a sealing member to seal a space between the cover and the process pipe, and a controller to control motor speed and limit motor torque while the cover moves from the furnace port to a predetermined position. The substrate is maintained at a rest position in the boat during a recovery from a deformation of the cover occurring when separating the sealing member from the cover surface or the process pipe surface.

Substrate processing apparatus and method of manufacturing semiconductor device

Provided are a substrate processing apparatus and a method of displaying an abnormal state of the substrate processing apparatus. The substrate processing apparatus including: a manipulation unit including a manipulation screen displaying a state of at least one of a substrate carrying mechanism and a substrate processing mechanism; and a control unit including a carrying system controller controlling the substrate carrying mechanism. The manipulation unit comprises a setting screen through which detection conditions of sensors configured to detect states of the substrate carrying mechanism and the substrate processing mechanism, and information about a torque limitation including the enabling or disabling of the torque control and a torque control value are set for the substrate carrying mechanism. The carrying system controller assigns a motion of the substrate carrying mechanism to a carrying control module based on an instruction from the manipulation unit, and the carrying control module controls the substrate carrying mechanism according to the instruction and the information.

Substrate processing apparatus and method of displaying abnormal state of substrate processing apparatus

A substrate processing apparatus capable of easily checking a state of a transfer mechanism when an error occurs and readily determining a cause of the error is provided. The substrate processing apparatus includes at least one sensor provided in a transfer mechanism for transferring a substrate, a transfer control module for receiving sensing data transmitted by the at least one sensor, a transfer system controller for controlling the transfer control module, and a manipulation unit at least including a display unit for displaying a state of the transfer mechanism based on the sensed data. Therefore, when an error occurs, at least the sensed data transmitted by the at least one sensor is displayed on the display unit.

Substrate processing apparatus, method of displaying error of substrate processing apparatus and transfer control method

Growing community of inventors

Toyama, Japan

Osamu Morita