Tokyo Electron Limited

Orion Wolfe

Sanjeev Kaushal

Sukesh Janubhai Patel

Wolfgang Polak

Aaron Archer Waterman

Kenji Sugishima

Robert Filman

Jessie Burger

A system and method autonomously determines the impact of respective tool parameters on tool performance in a semiconductor manufacturing system. A parameter impact identification system receives tool parameter and tool performance data for one or more process runs of the semiconductor fabrication system and generates a separate function for each tool parameter characterizing the behavior of a tool performance indicator in terms of a single one of the tool parameters. Each function is then scored according to how well the function predicts the actual behavior of the tool performance indicator, or based on a determined sensitivity of the tool performance indicator to changes in the single tool parameter. The tool parameters are then ranked based on these scores, and a reduced set of critical tool parameters is derived based on the ranking. The tool performance indicator can then be modeled based on this reduced set of tool parameters.

Method and apparatus for autonomous tool parameter impact identification system for semiconductor manufacturing

Systems and techniques to facilitate tool failure analysis associated with fabrication processes are presented. A monitoring component determines a candidate tool failure associated with one or more fabrication tools based on sensor data generated by a set of sensors associated with the one or more fabrication tools. A signature component generates a signature dataset for the candidate tool failure based on data associated with the one or more fabrication tools. A comparison component compares the candidate tool failure to at least one previously determined tool failure based on the signature dataset and at least one other signature dataset associated with the at least one previously determined tool failure.

Tool failure analysis using space-distorted similarity

A system and method autonomously determines the impact of respective tool parameters on tool performance in a semiconductor manufacturing system. A parameter impact identification system receives tool parameter and performance data for one or more process runs of the semiconductor fabrication system and generates a separate function for each tool parameter characterizing the behavior of a tool performance indicator in terms of a single one of the tool parameters. Each function is then scored according to how well the function predicts the behavior of the tool performance indicator, or based on a determined sensitivity of the tool performance indicator to changes in the single tool parameter. The tool parameters are then ranked based on these scores, and a reduced set of critical tool parameters is derived based on the ranking. The tool performance indicator can then be modeled based on this reduced set of tool parameters.

The subject disclosure relates to automatically learning relationships among a plurality of manufacturing tool parameters as applied to arbitrary semiconductor manufacturing tools and a graphical user interface that is supported, at least in part, by an autonomous learning system. The graphical user interface can create one or more matrixes based on received data and can further generate additional matrices by transforming the one or more matrixes. A series of windows can be output, wherein the series of windows, provide performance analysis that comprises a matching between a focus chamber and a reference chamber. In an aspect, the focus chamber and the reference chamber can be different chambers. In another aspect, the focus chamber and the reference chamber can be the same chamber, which provides analysis of the deterioration in performance of the same chamber over time.

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Orion Wolfe