Danmarks Tekniske Universitet

Onur Durucan

Anja Boisen

Michael Stenbaek Schmidt

Tomas Rindzevicius

The invention relates to a method for preparing a substrate comprising a sample reception area and a sensing area. The method comprises the steps of: 1) applying a sample on the sample reception area; 2) rotating the substrate around a predetermined axis; 3) during rotation, at least part of the liquid travels from the sample reception area to the sensing area due to capillary forces acting between the liquid and the substrate; and 4) removing the wave of particles and liquid formed at one end of the substrate. The sensing area is closer to the predetermined axis than the sample reception area. The sample comprises a liquid part and particles suspended therein.

Method for preparing a substrate by applying a sample to be analysed

The invention relates to a method for preparing a substrate () comprising a sample reception area () and a sensing area (). The method comprises the steps of: 1) applying a sample on the sample reception area; 2) rotating the substrate around a predetermined axis; 3) during rotation, at least part of the liquid travels from the sample reception area to the sensing area due to capillary forces acting between the liquid and the substrate; and 4) removing the wave of particles and liquid formed at one end of the substrate. The sensing area is closer to the predetermined axis than the sample reception area. The sample comprises a liquid part and particles suspended therein.

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Dyssegaard, Denmark

Onur Durucan