Fei Comapny

Ondrej R Baco

Trond Karsten Varslot

Martin Schneider

Maarten Kuijper

Pleun Dona

Erik Rene Kieft

Ondrej Ludmil Shanel

Jasper Frans Mathijs Van Rens

Wouter Verhoeven

Peter Mutsaers

Jom Luiten

Václav Batelka

Ondrej L Shánel

Methods include holding a sample with a movement stage configured to rotate the sample about a rotation axis, directing an imaging beam to a first sample location with the sample at a first rotational position about the rotation axis and detecting a first transmitted imaging beam image, rotating the sample using the movement stage about the rotation axis to a second rotational position, and directing the imaging beam to a second sample location by deflecting the imaging beam in relation to an optical axis of the imaging beam and detecting a second transmitted imaging beam image, wherein the second sample location is spaced apart from the first sample location at least at least in relation to the optical axis. Related systems and apparatus are also disclosed.

Beam trajectory via combination of image shift and hardware alpha tilt

Apertures having references edges are situated to define a sample irradiation zone and a shielded zone. The sample irradiation zone includes a portion proximate the shielded zone that is conjugate to a detector. A sample is scanned into the sample irradiation zone from the shielded zone so that the sample can remain unexposed until situated properly with respect to the detector for imaging. Irradiation exposure of the sample is reduced, permitting superior imaging.

Illumination apertures for extended sample lifetimes in helical tomography

Disclosed herein are radio frequency (RF) cavities and systems including such RF cavities. The RF cavities are characterized as having an insert with at least one sidewall coated with a material to prevent charge build up without affecting RF input power and that is heat and vacuum compatible. One example RF cavity includes a dielectric insert, the dielectric insert having an opening extending from one side of the dielectric insert to another to form a via, and a coating layer disposed on an inner surface of the dielectric insert, the inner surface facing the via, wherein the coating layer has a thickness and a resistivity, the thickness less than a thickness threshold, and the resistivity greater than a resistivity threshold, wherein the thickness and resistivity thresholds are based partly on operating parameters of the RF cavity.

Coating on dielectric insert of a resonant RF cavity

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Pristpo, Czechia

Ondrej R Baco