International Business Machines Corporation

Samsung Electronics Co., Ltd.

Advanced Micro Devices Corporation

Globalfoundries Singapore Pte. Ltd.

Infineon Technologies North America Corp.

Toshiba America Electronic Components, Inc.

Oluwafemi O Ogunsola

Matthew S Angyal

Alan Frederic Benner

Ravi Prakash Srivastava

Hyun-Min Choi

Habib Hichri

Craig Child

Jeong-Hoon Ahn

Hakeem B Akinmade-Yusuff

Muhammed Shafi Kurikka Valappil Pallachalil

Hideshi Miyajima

Methods of fabricating integrated circuit devices utilize fuse elements to support sequential testing of vertically-integrated test elements during fabrication. These methods include forming a first test element, a first fuse and a first test pad electrically connected by the first fuse to the first test element, on a substrate. The first test element is tested by passing a first current between the first test element and first test pad and through the first fuse. The first fuse is then 'cut' by increasing an impedance of the first fuse, which may include breaking the first fuse to create an electrical 'open' (infinite impedance) or greatly increasing a resistance of the first fuse (e.g., by narrowing the fuse through electromigration). A second test element and a second test pad, which is electrically connected to the second test element and the first test pad, are then formed on the substrate.

Methods of testing integrated circuit devices using fuse elements

A method of forming a device is disclosed. The method includes providing a substrate prepared with a dielectric layer having first and second regions. The first region comprises wide features and the second region comprises narrow features. A depth delta exists between bottoms of the wide and narrow features. A non-conformal layer is formed on the substrate and it lines the wide and narrow trenches in the first and second regions. The non-conformal layer is removed. Removing the non-conformal layer reduces the depth delta between the bottoms of the wide and narrow features in the first and second region.

Method to reduce depth delta between dense and wide features in dual damascene structures

A method including forming an organic polymer layer (OPL) on a substrate; forming a patterned photoresist layer having a first opening and a second opening over the OPL, the second opening wider than the first opening; performing a first reactive ion etch (RIE) to form a first trench and a second trench in the organic layer, the second trench wider than the first trench, the first trench extending into but not through the organic polymer layer, the second trench extending through the OPL to the substrate, the first RIE forming a first polymer layer on sidewalls of the first trench and a second polymer layer on sidewalls of the second trench, the second polymer layer thicker than the first polymer layer; and performing a second RIE to extend the first trench through the OPL to the substrate, the second RIE removing the second polymer layer from sidewalls of the second trench.

Method of reducing critical dimension process bias differences between narrow and wide damascene wires

Diffractive optical elements are used in methods and devices for coupling or distributing electromagnetic radiation. The diffractive optical. elements may be adapted to split one or more streams of radiation into multiple streams of radiation or to combine multiple streams of radiation to produce single streams. A plurality of diffractive optical elements may be fabricated on substrates by lithographic or molding methods. Diffractive optical elements that split one or more streams of radiation can be combined with diffractive optical elements that combine multiple streams of radiation to provide a coupling device, for example, a star coupler. The star coupler may be used in networked optical communication systems to provide multiple coupling between a plurality of optical drivers and a plurality of optical receivers. Aspects can be applied to any type of electromagnetic radiation having a wavelength that can be used as a medium for transferring information.

Methods and devices for coupling electromagnetic radiation using diffractive optical elements

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Hopewell Junction, NY, United States of America

Oluwafemi O Ogunsola