Massachusetts Institute of Technology

Olusegun J Ilegbusi

Julian Szekely

Improved Czochralski crystal growth apparatuses with bulk melt electromagnetic stirring and external axial magnetic fields selectively applied to a melt/growing crystal interface are provided. Such apparatuses are particularly well-suited for continuous feed growth processes.

Active magnetic flow control in Czochralski systems

A strong magnetic field, for example in the range of 500-50,000 Gauss, is applied across a tundish feeding continuous casting machines. The magnetic field, substantially perpendicular to the principal direction of flow within the tundish, provides very even flow in the tundish, uniform residence time and minimizes vortexing. The application of the magnetic field increases the percentage of inclusion particles removed from the melt during its residence within the tundish.

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Sharon, MA, United States of America

Olusegun J Ilegbusi