Commissariat a L'energie Atomique Et Aux Energies Alternatives

Commissariat a L'energie Atomique

Centre National De La Recherche Scientifique

Alcatel Vacuum Technology France

Synchrotron Soleil

Olivier Sublemontier

Nathalie Herlin-Boime

Youri Rousseau

Yann Leconte

Martin Schmidt

Benoit Barthod

Pierre-Yves Thro

Philippe Cormont

Pascal Boulanger

Guy Cheymol

Dominique Porterat

Christian Petit

Axelle Quinsac

Jean-Luc Lacour

Jean-Paul Gaston

Alain Billard

Olivier Gobert

Cesar Alvarez-Llamas

Sylvie Marguet

Frédéric Lacour

Frederic Lacour

Jean-Baptiste Sirven

Harold Kintz

Jérôme Caron

Cécile Reynaud

Frédéric Perry

Pascal Briois

Christophe Muller

Christophe Nicolas

Flory-Anne Barreda

Emmanuel Robert

Xavier Paquez

The invention concerns a system (S) for characterising the particles of an aerosol, characterised in that it comprises: The invention also relates to a method for implementing the system.

System for characterising particles in the form of an aerosol in an ambient gas and associated method

A device () for coating a substrate () with nanometric sized particles, wherein the device comprises: a plurality of aerodynamic lenses able to product a jet () of nanometric sized particles, each of the aerodynamic lenses having a longitudinal axis, the aerodynamic lenses being arranged so that the various longitudinal axes are parallel and oriented in a first direction (X) defining the direction of propagation of the jet and in the form of at least two columns () offset from each other in a second direction (Y) orthogonal to the first direction, where the first and the second column each comprise at least one of the aerodynamic lenses, the at least one of the aerodynamic lenses of the first column also being offset relative to the at least one of the aerodynamic lenses of the second column in a third direction (Z) that is both orthogonal to the first direction and to the second direction.

Device for depositing nanometric sized particles onto a substrate

A device for synthesising core-shell nanoparticles by laser pyrolysis is provided. The device includes a reactor having a first chamber for synthesising the core, which is provided with an inlet for a core precursor; a second chamber for synthesising the shell, which is provided with an inlet for a shell precursor; and at least one communication channel between the two chambers for transmitting the core of the nanoparticles to be formed in the first chamber towards the second chamber. The device also includes an optical device for illuminating each of the two chambers, and at least one laser capable of emitting a laser beam intended to interact with the precursors in order to form the core and the shell.

Device for synthesising core-shell nanoparticles by laser pyrolysis and associated method

The invention relates to a method for controlling the divergence of a jet of particles in vacuo with an aerodynamic lens, the aerodynamic lens including at least one chamber; a diaphragm, a so-called inlet diaphragm, intended to form an inlet of the aerodynamic lens for a jet of particles, the inlet diaphragm having a given diameter (d); and another diaphragm, a so-called outlet diaphragm, intended to form an outlet of the aerodynamic lens for this jet of particles; the method including: a step for generating the jet of particles from the inlet to the outlet, in vacuo, of the aerodynamic lens; and a step for adjusting the diameter (d) of the outlet diaphragm for controlling the divergence of the jet of particles.

Process for controlling, under void, a jet of particles with an aerodynamic lens and associated aerodynamic lens

The disclosure relates to a process for depositing nanoparticles on a substrate and comprising the following steps: The disclosure also relates to a substrate obtained by said process.

Process for generating a jet of nanoparticles

The present invention relates to a process for synthesizing a nanostructured composite material and to an implementation device associated with this process. The device () comprises a chamber () for synthesizing said material comprising a system () for depositing the matrix on a target surface (); a system () for generating a jet of nanoparticles in a carrier gas comprising an expansion chamber () equipped with an outlet orifice () for the nanoparticles toward the synthesis chamber (') and, in addition, means () for adjusting the distance L between the outlet orifice () of the expansion chamber and the target surface ().

Method for the synthesis of a nanostructured composite material and a device for implementing said method

A device for cutting a structure including nanotubes, including: a mechanism to polarize linearly laser pulses emitted in a direction of the structure, wherein a duration of the laser pulses is roughly between 1 femtosecond and 300 femtoseconds; and a mechanism to focus the linearly polarized laser pulses on the structure.

Device for cutting a structure including wire-like nanoscale objects, and related method

The invention relates to the synthesis of silicon-containing nanoparticles by laser pyrolysis. For this purpose: a precursor (SIH) containing the element silicon is conveyed, by a transport fluid (He), into a pyrolysis reactor (REAC); laser radiation (LAS) is applied, in the reactor, to a mixture that the transport fluid and the precursor form; and silicon-containing nanoparticles (nP) are recovered at the exit of the reactor. In particular, the power of the laser radiation is controlled. Furthermore, the effective pulse duration is controlled within a laser firing period. Typically, for a power greater than 500 watts and a pulse duration greater than 40% of a laser firing period, nanoparticles having a crystalline structure with a size of less than or of the order of one nanometer are obtained at a rate greater than or of the order of 80 milligrams per hour. Under optimum conditions, a record rate of greater than 740 milligrams per hour was able to be obtained.

Synthesis of silicon nanocrystals by laser pyrolysis

The invention relates to the synthesis of silicon-containing nanoparticles by laser pyrolysis. For this purpose: a precursor (SiH) containing the element silicon is conveyed, by a transport fluid (He), into a pyrolysis reactor (REAC); laser radiation (LAS) is applied, in the reactor, to a mixture that the transport fluid and the precursor form; and silicon-containing nanoparticles (nP) are recovered at the exit of the reactor. In particular, the power of the laser radiation is controlled. Furthermore, the effective pulse duration is controlled within a laser firing period. Typically, for a power greater than 500 watts and a pulse duration greater than 40% of a laser firing period, nanoparticles having a crystalline structure with a size of less than or of the order of one nanometer are obtained at a rate greater than or of the order of 80 milligrams per hour. Under optimum conditions, a record rate of greater than 740 milligrams per hour was able to be obtained.

The device comprises a device () for creating an essentially linear target () in an evacuated space where laser beams () are focused, the target being suitable for interacting with the focused laser beams () to emit a plasma emitting radiation in the extreme ultraviolet. A receiver device () receives the target () after it has interacted with the focused laser beams (), and a collector device () collects the EUV radiation emitted by the target (). The focusing elements () for focusing the laser beams on the target () are arranged in such a manner that the laser beams () are focused on the target () laterally, being situated in a common half-space relative to the target () and being inclined at a determined angle lying in the range about 60&#xb0; to about 90&#xb0; relative to a mean collection axis () perpendicular to the target (). The collector device () is disposed symmetrically about the mean collection axis () in the half-space containing the laser beams () focused on the target () and inside a conical space () centered on the mean collection axis () with a vertex situated at the target () and a half-angle at the vertex that is less than the angle of inclination of the focused laser beams () relative to the mean collection axis (). The device is suitable for use as a source for EUV radiation in lithography for fabricating integrated circuits.

Apparatus for generating light in the extreme ultraviolet and use in a light source for extreme ultraviolet lithography

Process and device for the generation of a fog of micrometric and submicrometric droplets, which may find application to the generation of light in the extreme ultraviolet range, particularly for lithography. According to the process and device, a pressurized liquid is injected into a very small diameter nozzle opening up into a vacuum. Light is generated by focusing laser radiation onto the fog.

Production of a dense mist of micrometric droplets in particular for extreme UV lithography

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Fontenay aux Roses, France

Olivier Sublemontier