Aixtron Se

Aixtron, Inc.

Olivier Feron

Adam Boyd

Johannes Käppeler

Jan Mulder

Daniel Claessens

Victor Saywell

James O'Dowd

A susceptor for a CVD-reactor includes insertion openings arranged in a bearing surface of the susceptor. An insertion section of a positioning element is inserted into one of the insertion openings. The insertion section forms positioning flanks with a section projecting from the insertion opening for fixing the position of a substrate. The insertion openings each have side walls and a base. The insertion section comprises bearing areas adjacent to the side walls of the insertion openings and a lower side of the positioning element facing the base of the insertion opening. The base of the insertion opening is separated from the lower side of the positioning element by a first distance. An edge protruding section of the positioning element is separated from a section of the bearing surface of the susceptor by a second distance.

Susceptor for a chemical vapour deposition reactor

The invention relates to a device for coating substrates having a process chamber () disposed in a reactor housing and a two-part, substantially cup-shaped susceptor () disposed therein, forming an upper susceptor part () with the cup floor thereof having a flat plate (') and a lower susceptor part () with the cup side walls thereof, the outer side () of the plate (&#x2032;) of the upper susceptor part () facing upwards toward the process chamber () and forming a contact surface for at least one substrate, the upper susceptor part () contacting a front edge (&#x2033;) of the lower susceptor part () at the edge of said upper susceptor part (), the lower susceptor part () being supported by a susceptor carrier (), and heating zones (A, B, C) for heating the upper susceptor part () being disposed below the plate (&#x2032;). An advantageous refinement of the invention proposes that the upper susceptor part () be removable from the process chamber () separately from the lower susceptor part (), and the joint () between the edge of the upper susceptor part () and the front edge (&#x2033;) of the lower susceptor part () be formed as a heat conduction barrier.

Device for coating substrates disposed on a susceptor

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Gemmenich, Belgium

Olivier Feron