Pivot A.s.

Platit A.s.

Olivier Coddet

Mojmir Jilek

Marcus Morstein

Michal Sima

Mojmir Jilek Jun

Mojmir Jilek Sen

Vacuum deposition apparatus including cathodic arc source for application of coatings on the substrate. Cathodic arc source comprises focusing magnetic source for generating magnetic field, arc cathode containing film forming material and anode. The focusing magnetic source is placed between arc cathode and substrate. Arc spot generated on the cathode evaporation surface is kept by the magnetic field lines in the place where the magnetic field lines are perpendicular to the cathode surface.

Filtered cathodic arc deposition apparatus and method

A hard, wear-resistant aluminum nitride based coating of composition AlSiMeN is proposed; x, y and z denote atomic fractions, the sum of which is between 0.95 and 1.05, and wherein Me is a metal dopant of group III to VIII and Ib transition metals or a combination thereof. The metal provides, during the coating process, an intrinsic electrical conductivity higher than the coating without the metal doping. The silicon content is in between 0.01&#x2266;y&#x2266;0.4 and the content of the metal dopant or dopants Me is 0.001&#x2266;z&#x2266;0.8, preferably 0.01&#x2266;z&#x2266;0.05 and most preferably 0.015&#x2266;z&#x2266;0.045.

Hard, wear-resistant aluminum nitride based coating

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Biel, Switzerland

Olivier Coddet