Cemecon Ag

Diaccon Gmbh

Cemecon-ceramic Metal Coatings-dr. Ing. Antonius Leyendecker Gmbh

Dr.-ing. Toni Leyendecker

Oliver Lemmer

Stephan Bolz

Christian Bareiss

Stefan Rosiwal

Antonius Leyendecker

Werner Kölker

Martin Frank

Werner Koelker

Martin Rueffer

Walter Reichert

Marc Perle

Lars Hultman

Grzegorz Greczynski

Dirk Breidt

Biljana Mesic

Toni Leyendecker

Stefan Esser

Manfred Weigand

Jürgen Balzereit

Michael Woda

Werner Pütz

Martin RÜFFER

The invention relates to a method for coating a substrate, a coating system for carrying out the method, and a coated body. In a first method step, the substrateis pretreated in a ion etching process. In a second method step, a first coating layerwith a thickness of 0.1 μm to 6 μm is deposited on the substrateby means of a PVD process. In order to achieve a particularly high-quality and durable coating, the surface of the first coating layeris treated by means of an ion etching process in a third method step, and an additional coating layerwith a thickness of 0.1 μm to 6 μm is deposited on the first coating layerby means of a PVD process in a fourth method step. The coated body comprises at least two coating layerswith a thickness of 0.1 μm to 6 μm on a substrate, wherein an interface region formed by ion etching is arranged between the coating layers

Multi-layer coating

The invention relates to a sputtering target, a coating system, and a coating method for same. The sputtering target comprises a base plate with a target plate which is secured thereon and which is made of a first sputtering material with a surface and a plurality of recesses formed therein. A plurality of inserts are arranged in the recesses. At least some of the inserts are made of a second sputtering material, wherein the second sputtering material has a higher sputter yield than the first sputtering material. The aim of the invention is to achieve especially uniform coatings. This is achieved in that the inserts made of the second sputtering material are shaped such that the extent D1, D2 of the inserts, measured in a measuring direction parallel to the surface, increases from the surface to the base plate in a depth direction T.

Sputtering target

The invention relates to a coated body and to a method for coating a body. The coated body comprises at least a substrate (), a diamond layer () having a thickness of 1-40 &#x3bc;m, and a hard material layer (), which is arranged farther outside on the body () than the diamond layer (). The hard material layer () comprises at least one metal element and at least one non-metal element. An adhesive layer () having a thickness of 2-80 nm is provided between the diamond layer () and the hard material layer (). The adhesive layer () contains carbon and at least one metal element. The diamond layer () can be applied by means of a CVD method. The hard material layer can be applied by means of a PVD method. The adhesive layer () between the diamond layer () and the hard material layer () can be produced in that, before the hard material layer () is applied, the surface of the diamond layer () is pretreated by means of HIPIMS metal ion etching, wherein ions are implanted into or diffuse into the surface of the diamond layer () by means of metal ion etching.

Coating a body with a diamond layer and a hard material layer

A tool for machining fiber-reinforced materials, said tool having a tool body having a particular cutting edge that has at least a main function surface and has a diamond coating applied at least to said main function surface. In order to provide a tool and a method which are especially suitable for machining fiber-reinforced materials, the surface of the diamond coating has a reduced peak height Spk of less than 0.25 &#x3bc;m.

Tool and method for machining fiber-reinforced materials

A process and a device for coating a substrate () are described. In a vacuum chamber (), a first magnetron cathode () is provided with a sputtering target () of a first metal composition comprising predominantly aluminium. A second magnetron cathode () is provided with a sputtering target () of a second metal composition comprising at least 50 at-% of a second metal selected from groups IVA-VIA of the periodic table. In order to obtain coatings with improved properties, electrical power is supplied to the cathodes () such that the targets () are sputtered, where electrical power is supplied to the first cathode () as pulsed electrical power according to high power impulse magnetron sputtering with a first peak current density, and to the second cathode () with a second peak current density lower than the first peak current density. The substrate () is arranged within the vacuum chamber such that particles from the plasma deposit onto the substrate forming a coating.

Coating of substrates using HIPIMS

The invention relates to a device for coating a substrate using CVD, in particular for coating with diamond or silicon, wherein a neat conductor array composed of a plurality of elongated heat conductors () is provided in a housing (), said heat conductors extending between a first () and a second electrode (), wherein the heat conductors are held individually tensioned by a weight () attached to one end thereof. To increase the life of the neat conductors (), the invention proposes that the weight () or the heat conductor () be guided at the second electrode (), forming an electrical loop contact, in such a way that a vector of the weight force (G) produced by the weight () makes an angle (&#x3b1;) of no more than 45&#xb0; with a direction of the longitudinal extension of the heat conductor ().

Device and method for coating a substrate using CVD

The invention relates to a body with a substrate (), an intermediate layer () applied on top thereof and a CVD diamond layer () applied to the intermediate layer. In order to propose a body coated with CVD diamond and a production process, in which the body has an increased load-bearing capacity under various mechanical loads, provision is made for the intermediate layer to be predominantly metallic, wherein the metal fraction of the intermediate layer consists predominantly of tungsten and/or chromium, and for the intermediate layer to have a roughness defined by an Rz value of 0.5 &#x3bc;m-3.0 &#x3bc;m.

Coated body and a process for coating a body

The invention relates to a device for coating a substrate () using CVD, in particular for coating with diamond or silicon, wherein a heat conductor array comprising a plurality of elongated heat conductors () is provided in a housing (), said heat conductors extending between a first () and a second electrode (), wherein the heat conductors () are held individually tensioned by a tensioning device attached to one end thereof. For the purposes of improving the life of the heat conductors (), the invention proposes that the tensioning device comprises a tilt arm () having a tensioning weight (G), the heat conductor () being attached to the first end (E) of said tilt arm, and the second end thereof substantially being mounted pivotably about a horizontal axis (H).

The invention refers to a method and apparatus for CVD coating and to a coated body. To improve the mechanical properties of the structure and surface of the body and to make the method and apparatus as simple and cost-effective as possible, it is suggested in the method, in which a layer is deposited on a substrate in a carbon-containing gas atmosphere: In this way, a body can be produced with a substrate and at least one layer deposited on the surface of the substrate, wherein the layer consists of nano-crystalline diamond.

Body having a smooth diamond layer, device and method therefor

The present invention relates to a component, for example a tool, coated with a hard material, in particular diamond, a process for its production and a device for carrying out the process. The process for the production of the component coated with the hard material comprises the steps of: a) introducing a fine-grained cemented carbide or carbide-containing cement substrate into a vacuum system with a heating device and at least one gas feed connection; b) removing carbon from the carbides of a surface layer of the substrate at a substrate temperature in the region of about 900&deg; C. to about 1400&deg; C. and in an oxygen-containing atmosphere; c) introducing carbon into the surface layer of the substrate at a substrate temperature in the region of about 900&deg; C. to about 1400&deg; C. and in a carbon-containing atmosphere; and d) coating the substrate with the hard material.

Hard material coating of a cemented carbide or carbide containing cermet substrate

A multi-component, metal-containing, wear-resistant coating which is not homogeneous. The coating has a difference of a metallic element concentration of at least about 2 atom percent between the edges of the coating surface and the coating surface remote from the edge. Non-homogeneous coatings of the invention are surprisingly wear-resistant compared to homogeneous coatings. The invention also relates to a method of applying the coatings of the invention by a PVC-process or a plasma-CVD-process wherein the electrical potential difference between the substrate and the ionized coating material is selected to enhance the inhomogeneity of the coating.

Growing community of inventors

Aachen, Germany

Oliver Lemmer