Merck Patent Gmbh

Air Products and Chemicals, Inc.

Merck Patent Gesellschaft MIT Beschrankter Haftung

Imec Vzw

Interuniversitair Microelektronica Centrum (imec)

Oliver Doll

Ingo Koehler

Werner Stockum

Paul Mertens

Rita Vos

Bernd Kolbesen

Christian Matuschek

Sebastian Barth

Mark James

Marc Hunger

Laurent Deloux

Cairon Platzer

Albrecht Fester

Johannes Tasch

Edward Plummer

Piotr Wierzchowiec

The present invention relates to a novel process for the preparation of printable, high-viscosity oxide media, and to the use thereof in the production of solar cells.

Doping media for the local doping of silicon wafers

The present invention relates to aluminium oxide pastes and to a process for the use of the aluminium oxide pastes for the formation of AlOcoatings or mixed AlOhybrid layers.

Aluminium oxide pastes and process for the use thereof

The present invention refers to a method for selectively structuring of a polymer matrix comprising AgNW (silver nano wires) or CNTs (carbon nano tubes) or comprising mixtures of AgNW and CNTs on a flexible plastic substructure or solid glass sheet. The method also includes a suitable etching composition, which allows to proceed the method in a mass production.

Selective etching of a matrix comprising silver nano wires

The present invention relates to a method for producing solar cells with local back surface field (LBSF) using an alkaline etching paste which allows the back surface to be polished and the back surface edges to be insulated in a single process step.

Process for the production of solar cells having a local back surface field (LBSF)

The present invention relates to a process for the production of solar cells comprising a selective emitter using an improved etching-paste composition which has significantly improved selectivity for silicon layers.

Process for the production of solar cells comprising a selective emitter

The object of the present invention is a new inkjet printable etching composition comprising an etchant, which is activated by a second component. Thus, a further object is the use of this new composition in a process for the etching of surfaces semiconductor devices or surfaces of solar cell devices.

Two component etching

The present invention relates to a method for the wet-chemical edge deletion of solar cells. An etching paste is applied to the edge of a solar cell substrate surface and after the reaction is complete, the paste residue is removed. Optionally, the substrate surface is cleaned and dried. The etching paste comprises 85% HPO, NHHFand 65% HNOin a ratio in the range from 7:1:1.5 to 10:1:3.5, based on the weight.

Edge deletion of thin-layer solar modules by etching

The present invention recites a composition comprising a first compound and a second compound. The first compound has the chemical formula ( 1a), wherein m, n and o are independently from each other equal to 2 or 3; wherein p is equal to 1 or 2; R being a chemical group with the chemical formula (1a'), wherein q is equal to 1, 2 or 3; wherein R, Rand Rare independently selected from the group consisting of hydrogen and an organic group. The second compound has the chemical formula (1c). Metal ions can be present in the solution or in an external medium being contacted with the solution. The present invention can be used for cleaning a semiconductor substrate. 

Semiconductor cleaning solution

The present invention is related to a composition comprising an oxidizing compound and a complexing compound with the chemical formula wherein R1, R2, R3 and R4 are selected from the group consisting of H and any organic side chain. The oxidizing compound can be in the form of an aqueous solution. The complexing compound is for complexing metal ions. Metal ions can be present in the solution or in an external medium being contacted with the solution. The present invention can be used for cleaning a semiconductor substrate 

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Dietzenbach, Germany

Oliver Doll