Asml Netherlands B.v.

Shell Internationale Research Maatschappij, B.v.

Olga Vladimirovna Elisseeva

Nicolaas Ten Kate

Nicolaas Rudolf Kemper

Michel Riepen

Marco Koert Stavenga

Erik Henricus Egidius Catharina Eummelen

Tijmen Wilfred Mathijs Gunther

Christian Gerardus Norbertus Hendricus Marie Cloin

Michaël Christiaan Van Der Wekken

Nina Vladimirovna Dziomkina

Arun Selvaraj Kousalya

Joshua Etkind

A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

Lithographic apparatus and a method of operating the apparatus

An immersion lithographic apparatus has a surface that in use is contacted by the immersion liquid and the surface has a surface roughness Rthat is less than or equal to 0.2 &#x3bc;m. Immersion liquid on the surface may have a contact angle of 60&#xb0; or greater. The surface may be able to maintain its properties so that immersion liquid on the surface may have the contact angle for a prolonged period of immersion in the immersion liquid.

Immersion lithographic apparatus and a device manufacturing method

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Waalre, Netherlands

Olga Vladimirovna Elisseeva