Asml Netherlands B.v.

Oleg Yakushev

Vadim Yevgenyevich Banine

Konstantin Nikolaevitch Koshelev

Konstantin Nikolaevich Koshelev

Vladimir Vitalevich Ivanov

Yurii Victorovitch Sidelnikov

Vladimir Mihailovitch Krivtsun

Evgeny Dmitrievich Korop

Denis Alexandrovich Glushkov

Kurt Gielissen

Givi Georgievich Zukakishvili

Vladimir Mihallovitch Krivtsun

A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy.

Lithographic apparatus

An apparatus for forming a beam of electromagnetic radiation. The apparatus includes a plasma radiation source, a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source, and a grid disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. An electrical potential application circuit is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap. A distance between the grid and the foil trap is at least equal to one-half of a radius of the foil trap.

Apparatus with plasma radiation source and method of forming a beam of radiation

An apparatus for forming a beam of electromagnetic radiation includes a plasma radiation source, and a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source. A grid is disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. The apparatus also include an electrical potential application circuit that is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap.

Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus

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Korolev, Russia

Oleg Yakushev