Asml Netherlands B.v.

Oleg Voznyi

Franciscus Johannes Joseph Janssen

Jan Bernard Plechelmus Van Schoot

Han-Kwang Nienhuys

Martijn Houben

Leon Martin Levasier

Yuri Johannes Gabriël Van De Vijver

Marcio Alexandre Cano Miranda

Rene Theodorus Petrus Compen

Danny Maria Hubertus Philips

Martinus Agnes Willem Cuijpers

Manish Ranjan

Roger Wilhelmus Antonius Henricus Schmitz

Alain Louis Claude Leroux

Albert Pieter Rijpma

Remko Wakker

Kursat Bal

Oleksiy Galaktionov

Majid El Bouchaibi

Franciscus Johannes Maria Boekholt

Nicolaas Ten Kate

Cheng-Qun Gui

Johannes Onvlee

Henricus Wilhelmus Maria Van Buel

Laurentius Johannes Adrianus Van Bokhoven

Mark Johannes Hermanus Frencken

Remi Daniel Marie Edart

Rudy Jan Maria Pellens

Keith Frank Best

Pascale Anne Maury

Theodorus Marcus Nagtegaal

The invention provides an object positioner comprising:—an object support having an object support surface which is configured to engage at least a part of an object, said object support surface having a support surface temperature,—a thermal device, which thermal device is configured to provide at least a part of the object with a first object temperature, which first object temperature differs from the support surface temperature by a first predetermined temperature difference.

Object positioner, method for correcting the shape of an object, lithographic apparatus, object inspection apparatus, device manufacturing method

A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed, the apparatus including a substrate table constructed to hold a substrate, a first clamping system configured to clamp the substrate table to a substrate table support structure, and a second clamping system configured to clamp a substrate to the substrate table after the substrate table has been clamped to the substrate table support structure.

Lithographic apparatus and device manufacturing method

A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.

According to a first aspect of the invention, there is provided a lithographic method of providing an alignment mark on a layer provided on a substrate, the method including providing the alignment mark on an area of the layer which is oriented within a certain range of angles with respect to a surface of the substrate on which the layer is provided.

Lithographic apparatus and method

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Eindhoven, Netherlands

Oleg Voznyi