Extraction Systems, Inc.

Entegris, Inc.

Mykrolis Corporation

Oleg P Kishkovich

William M Goodwin

Devon A Kinkead

Anatoly Grayfer

David Ruede

Robert W Rezuke

David L Halbmaier

John C Gaudreau

Troy B Scoggins

John E Sergi

Anthony Simpson

Frank Manganiello

Mark C Phelps

James Lo

Thomas B Kielbaso

Xavier Gabarre

Devon Kinkhead

William Goodwin

Kevin Kinkead

Robert Rezuke

Tom Kielbaso

Frank Manganielo

The present invention provides a method, system, and components for protecting reticles and specifically for minimizing haze formation on reticles during storage and use. By substantially continually maintaining a purge in a storage housing having a reduced humidity level on reticles or by temporarily storing the reticle in a container in proximity to a desiccant or getter when not being purged, haze formation can be eliminated, minimized, or sufficiently controlled. Moreover, a filter media in the container may be positioned to be 'recharged' during the substantially continual purging of the reticle, a reduced desirable humidity level can be readily maintained in the reticle container when the container is not currently being purged. Additionally, the system of the invention can comprise an ionizer associated with the purge system. For example, the ionizer can be associated with at least one of the plurality of purge lines of the purge system. The system of the invention can also include a purge gas source connected to the purge system that comprises a source of CDA or extra CDA. The storage housing can comprise a plurality of shelves that each include a plurality of reticle storage receptacles.

System for purging reticle storage

A filter includes at least two different adsorptive media. First, chemisorptive media, which is porous and includes an acidic functional group, is used to remove molecular bases, including ammonia, organic amines, imides and aminoalchols, from the atmosphere used in semiconductor fabrication and other processes that require uncontaminated gaseous environments of high quality. Second, physisorptive media is able to adsorb condensable contaminants, particularly those having a boiling point greater than 150 degrees C. The physisorptive media can include untreated, activated carbon.

Filters employing both acidic polymers and physical-adsorption media

The invention provides a system and method comprising an apparatus for removing contaminants from a gas in a semiconductor processing device, which can include a filter unit having at least two parallel filter stages located therein. The filter stages are designed to remove a least a portion of the contaminants present in the gas flowing through them. The apparatus can also include a flow controller for distributing the gas flow among the filter stages. In one embodiment, the controller may consist of a diffuser plate. The invention also provides a sampling tube orifice for gas flow control in a system or method of the invention. In another embodiment, an apparatus for removing contaminants from a gas in a clean room comprises a filter unit having at least two parallel filter stages, which are used to remove a portion of the contaminants in the gas as it passes through the apparatus.

System and method for removing contaminants

The present invention provides a filtering system for a semiconductor processing tool. In one embodiment, the filtering system is associated with the semiconductor processing tool. A system of the invention comprises a first and second filter layer in fluid communication with a gas flow path. The flow path is a gas stream comprising volatile silica containing compounds such as hexamethyldisiloxane and trimethylsilanol. The gas flow path passes through the first and second filter layer to fluidly communicate with the semiconductor processing tool. Preferably, the first filter layer of the filtering system is upstream along the gas flow path from the second filter layer. The medias of the first and second filter layers are selected and arranged based on given contaminant concentrations. The invention also provides a method for filtering gas containing hexamethyldisiloxane and trimethylsilanol in communication with a semiconductor processing tool, which employs a system comprising a first and second filter layer.

Filtering system for a semiconductor processing tool

The present invention provides a standardized mechanical interface (SMIF) reticle pod that is configured to provide a controlled environment for supporting a reticle wherein the controlled environment is maintained substantially free of crystal growth causing contaminants. Accordingly, there is provided a layered filter with filter elements capable of filtering particulates and adsorbing gaseous contaminants. The filter has an inwardly facing face generally planar shaped with a surface area that is substantially half or more of the area of the reticle face. The inwardly facing face is placed in close proximity to the reticle patterned surface and has an area that is a significant fraction of the reticle patterned surface area. The SMIF pod is also provided with a purge system configured to inject a very dry gas within the controlled environment to flush the controlled environment of contaminants as well as to regenerate the filter.

Environmental control in a reticle SMIF pod

The present invention relates to systems and methods for controlling humidity and temperature in gases or air streams used in semiconductor processing systems. These systems and methods can be used in combination with systems and methods for contaminant detection and removal.

Air handling and chemical filtration system and method

The present invention provides passive sampling systems and methods for monitoring contaminants in a semiconductor processing system. In one embodiment, that passive sampling system comprises a collection device in fluid communication with a sample line that provides a flow of gas from a semiconductor processing system. The collection device is configured to sample by diffusion one or more contaminants in the flow of gas.

System and method for monitoring contamination

A clean, high efficiency, low pressure drop, adsorptive filter material that is porous and includes an acidic functional group. The filter can include, for example, a non-woven filter composite has a porous sulfonated divinyl benzene styrene copolymer beads having sulfonic acid functional side groups. The non-woven filter is used to remove molecular bases, including ammonia, organic amines, inides, aminoalcohols, alcoholoamines from the atmosphere used in semiconductor fabrication and other processes that require uncontaminated gaseous environments of high quality.

Filters employing porous strongly acidic polymers

A detection system for detecting contaminant gases includes a converter, a detector, a primary channel for delivering a target gas sample through the converter to the detector, and at least two scrubbing channels for delivering a reference gas sample through the converter to the detector. Each of the scrubbing channels includes a scrubber for removing basic nitrogen compounds from the reference gas sample, while the primary channel preferably transmits the target gas sample without scrubbing. The converter converts gaseous nitrogen compounds in the target gas sample to an indicator gas, such as nitric oxide (NO), and a control system directs the flow of a gas sample among the primary channel and the scrubbing channels. In accordance with one aspect of the invention, the basic-nitrogen-compound concentration can be measured by comparing the concentration of the indicator gas detected in the reference sample with the detected indicator-gas concentration in the target sample. The use of multiple scrubbing channels enables the detection to operate continuously since each scrubber can be alternately purged while another is scrubbing.

Detection of base contaminants in gas samples

A filter includes at least two different adsorptive media. First, chemisorptive media, which is porous and includes an acidic functional group, is used to remove molecular bases, including ammonia, organic amines, imides and aminoalcohols, from the atmosphere used in semiconductor fabrication and other processes that require uncontaminated gaseous environments of high quality. Second, physisorptive media is able to adsorb condensable contaminants, particularly those having a boiling point greater than 150 degrees C. The physisorptive media can include untreated, activated carbon.

Methods using filters employing both acidic polymers and physical-adsorption media

A preferred embodiment includes a method for monitoring the performance of a filter positioned in an airstream in a semiconductor processing system. The method includes sampling the airstream at a location upstream of the filter to detect the molecular contaminants present in the airstream; identifying a target species of the contaminants upstream; selecting a non-polluting species of a contaminant having a concentration greater than a concentration of the target species; measuring the non-polluting species in the airstream at a plurality of locations; and determining the performance of the filter with respect to the target species from measurements of the non-polluting species. The plurality of locations includes a location downstream of the filter and at a location within the filter. Further, the method for monitoring includes generating a numerical representation of a chromatogram of the airstream sampled at a location upstream of the filter. The method for monitoring includes the non-polluting species having a molecular weight that is lower than that of the target species. In addition, in the method for monitoring the step of sampling includes collecting refractory compounds, high molecular weight compounds and low molecular weight compounds. The filter comprises absorptive material.

System and method for determining and controlling contamination

A system and method for determining and removing contamination recognizes the need to determine contamination caused by a plurality of contaminants which includes refractory compounds, high molecular weight compounds and low molecular compounds operating at different rates. The system in accordance with a preferred embodiment of the present invention includes a collection device that emulates the environment of the surfaces of certain optical elements. The method for determining and preferably removing contamination includes maintaining an extended duration sampling time to enable the collection of a desirable mass of high molecular weight compounds. In a preferred embodiment, the collection device is operated past a breakthrough capacity to quantitatively measure high molecular weight compounds and other contaminants.

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Greenville, RI, United States of America

Oleg P Kishkovich