Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Ole Fluegge

Markus Hauf

Jochen Weber

Toralf Gruner

Ulrich Schoenhoff

Arif Kazi

Payam Tayebati

Michael Thier

Alexander Sauerhoefer

Gerhard Focht

Eric Eva

Aksel Goehnermeier

Dirk Hellweg

Erich Merz

Tilmann Heil

Dieter Bader

Kai-Uwe Berroth

Cornelia Buehler

Alexander Ostendorf

A sealing device seals a first component part of a lithography apparatus vis-&#xe0;-vis a multiplicity of second component parts of the lithography apparatus. The sealing device includes a multiplicity of sealing rings and a multiplicity of connection locations. The sealing rings are connected to one another with the aid of the connection locations.

Sealing device, component and lithography apparatus

The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.

Optical element and method

The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.

Optical correction device

In some embodiments, the disclosure relates to an optical assembly that includes an optical element and a structure element. A gap runs between the optical element and the structure element. A sealing element may be present to seal the gap. At least one liquid layer may be arranged between the structure element and/or the optical element, and the sealing element so that a relative displacement of the sealing element with respect to the structure element and/or the optical element is possible in the direction of the layer plane.

Optical assembly, projection exposure apparatus and projection objective

Growing community of inventors

Bartholomae, Germany

Ole Fluegge