Von Ardenne Anlagentechnik Gmbh

Grenzebach Maschinenbau Gmbh

Fhr Anlagenbau Gmbh

Olaf Gawer

Wolfgang Erbkamm

Jens Melcher

Dietmar Schulze

Hans-Christian Hecht

Gerd Kleideiter

Joerg Fiukowski

Holger Richert

Bernd-Dieter Wenzel

Jens Ellrich

Thomas Krisch

Sascha Kreher

Jörg Fiukowski

A device for coating sheet-type substrates, in particular glass panes, in a vacuum coating system is described. The system includes a) a series connection of chambers, through which each substrate sheet passes and which are arranged on the entry side, namely a load lock chamber, a buffer chamber and a transfer chamber, each of which is vacuum-sealable by a check valve. An area of process chambers follows the transfer chamber and the process chamber is followed by a transfer chamber, buffer chamber and load lock chamber. The system also includes b) a conveyor device; c) a vacuum pump with an adapter flange in the region of the buffer chamber; d) at least two flow baffles in the buffer chamber; e) a system for the longitudinal and height displacement of the flow baffles; and f) an assembly for controlling the dynamic processes.

Device for coating extra-long sheet-type substrates, in particular glass panes, in a vacuum coating system

Disclosed are an apparatus and a method for saving energy while increasing the conveying speed in vacuum coating plants consisting of a series of sputtering segments () and gas separation segments () along with a continuous substrate plane (). Said apparatus has the following features: a) each of the sputtering segments () consists of a tank tub () inside which a conveying device () is located; the flange () of the tank is positioned in the immediate vicinity above the substrate plane (); a cathode bearing block (), along with targets () and gas inlet ducts (), is located in the tank cover () in the immediate vicinity of the substrate together with splash guards (); b) in the region of the substrate plane (), the gas separation segments () are provided with a tunnel cover () that extends along the entire length of the gas separation segment (); c) sputtering segments () and/or gas separation segments () are evacuated using one or more vacuum pumps (), and the air pumped in said process is trapped in an air reservoir () having an adjustable volume.

Method and apparatus for saving energy while increasing the conveying speed in vacuum coating plants

An arrangement is provided for feeding in HF current for rotatable tubular cathodes in a vacuum chamber of a plasma coating system as well as a high frequency current source. Located inside the tubular cathode is a magnet arrangement that extends along said tubular cathode for generating a magnetic field. The arrangement enables a low loss infeed of HF current, so that a particularly homogeneous sputter removal from the tubular cathode is guaranteed. The HF current source is coupled to the tubular cathode inside the vacuum chamber by a capacitive infeed of HF current in the form of a coupling capacitor. The coupling capacitor includes a part of the surface of the tubular cathode and a metal plate or metal film that surrounds the tubular cathode, at least partially, at a specified distance.

Assembly for feeding in HF current for tubular cathodes

A sluice system for a vacuum coating facility for coating substrates that can be moved through the vacuum coating in a direction of conveyance comprises a prevacuum slice chamber and a transfer chamber adjoining a coating chamber, wherein a fine vacuum can be regulated before the transfer chamber on the input side in the direction of conveyance and after the transfer device on the output side in the direction of conveyance. The prevacuum sluice chamber is directly adjacent to the transfer chamber and the fine vacuum can be regulated in the prevacuum sluice chamber. A high-vacuum pump system can also alternatively and selectively be connected to the prevacuum sluice chamber.

Sluice system for a vacuum facility

An elongate vacuum system for coating one or both sides of a flat substrate which can be displaced by the system, comprises at least one magnetron provided with a magnetron surrounding area and is subdivided into successive compartments in the direction of transportation of the substrate by separating walls having closeable suction openings. The compartments can be evacuated either directly by a vacuum connection provided on the compartment or indirectly via a suction opening in the separating wall. At least one compartment comprises an upper partial compartment which is arranged above the substrate. The partial compartment comprises a closeable upper opening in at least one of the outer walls thereof. The aim is to produce an elongate coating system which is flexible to use according to the requirements of various one and two-sided coating processes and ensures a stable, differential and process-optimized sputter atmosphere. At least in one of the upper partial compartments, horizontal and/or vertical elements can be mounted in order to subdivide the upper partial compartment into several sections.

Elongate vacuum system for coating one or both sides of a flat substrate

The invention which relates to a device for the generating of electron beams with a vacuum chamber, in which a massive cathode (10) is arranged with a wire cathode (14) arranged above and a aperture anode (17) below the massive cathode (10) and whom below the aperture anode (17) focusing and/or deflecting magnet arrangements are provided which direct an electron beam (23) emitted by the massive cathode (10) and accelerated by the aperture anode (17) to a processing location (22), has the basic task to make the power of such devices variable over a large range using simple mechanical means. According to the invention the task is solved by arranging the aperture anode (17) rigidly and the massive cathode (10) and the wire cathode (14) axially movable within the vacuum chamber (1). For the movements of the massive cathode (10) and the wire cathode (14) contact means are provided which follow their movements and lead to the outside of the vacuum chamber (1). In addition for the axial movement of the massive cathode (10) a motion means is provided connected with the cathode (Figure).

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Dresden, Germany

Olaf Gawer