Samsung Electronics Co., Ltd.

Ohchel Kwon

Hyunchul Kim

Sangwoo Kim

Youngchan Kim

Kyung-Tae Jang

Seohyun Kim

Yongmyung Jun

Tae-Jong Han

Daewoong Kim

Bongcheol Kim

Seungbu Baek

Hyunwoo Nho

Jaeseong Ryu

Daewoong Choi

Hyeongkwon Jeong

A supercritical fluid processing apparatus including a supercritical fluid supply module including a gas liquefier to liquefy a gas transferred from a gas supply and provide a liquefied fluid, a storage tank to change the liquefied fluid to a supercritical state and store a supercritical fluid, and an internal pipe connecting the gas liquefier to the storage tank; an exhaust fluid supply module including an exhaust fluid liquefier including a regeneration storage tank to collect a first exhaust fluid from the storage tank, and a refrigerant pipe to liquefy the first exhaust fluid in the regeneration storage tank and maintain the liquefied first exhaust fluid at a predetermined temperature/pressure; a first exhaust pipe to transfer the first exhaust fluid from the storage tank to the exhaust fluid liquefier; and a resupply pipe to resupply the first exhaust fluid collected and liquefied in the exhaust fluid liquefier to the storage tank.

Supercritical fluid processing apparatus and substrate processing system including the same

Methods of forming vertical nonvolatile memory devices utilize carbon-blocking sacrificial capping layers to increase device yield by reducing the likelihood that one or more vertically-stacked layers of materials will lift-off during fabrication. These capping layers may be provided to cover carbon-containing sacrificial layers that are highly polymerized.

Methods of forming semiconductor memory devices having vertically stacked memory cells therein

Growing community of inventors

Hwaseong-si, South Korea

Ohchel Kwon