Lg Display Co., Ltd.

Lg Philips Lcd Co., Inc.

Dongwoo Fine-Chem Co., Ltd.

Lg.phillips Lcd Co., Ltd.

Dongjin Semichem Co., Ltd.

Oh-Nam Kwon

Kyoung-Mook Lee

Gee-Sung Chae

Yong-Sup Hwang

Gyoo-Chul Jo

Seung-Hee Nam

Cyoo-Chul Jo

Nack-Bong Choi

Heung-Lyul Cho

Choon-Ho Park

Yong-In Park

Seong-Bae Kim

Yu-Sok Lim

Jong-Kwon Lee

Suk-Chang Jang

Jae-Beom Choi

Woong-Kwon Kim

Kyoung-Su Ha

Seung-Han Paek

Byung-Uk Kim

Seung-yong Lee

Yong-suk Choi

Sang-Dai Lee

Seung-Chul Kang

Kyoung-Muk Lee

Seong-Su Kim

Jong-Soon Yoo

Youn-Gyoung Chang

Soon-Sung Yoo

Sang-Il Shin

Duk-Chul Yun

Jae-Gu Lee

Kui-Jong Baek

Tai-Hyung Rhee

Jea-Gu Lee

Suk-ll Yoon

An electrophoretic display device includes a switching element on a substrate including a display area having a pixel region and a non-display area at a periphery of the display area, a passivation layer covering the switching element, a pixel electrode on the passivation layer and connected to the switching element, an electrophoresis film on the pixel electrode and including an ink layer and a base film, wherein the ink layer includes a plurality of charged particles, and the base film is formed of polyethylene terephthalate, a common electrode for generating an electric field with the pixel electrode to drive the electrophoresis film, and a color filter layer directly on the electrophoresis film, wherein the color filter layer is formed under temperatures of less than 100 degrees of Celsius.

Electrophoretic display device and method of fabricating the same

A method for fabricating color filter layer of an LCD comprises forming a plurality of black matrixes separated at certain intervals on a color filter substrate, and forming R, G and B color filter layers by using a plurality of needles between the plurality of black matrixes on the color filter substrate.

Method for fabricating color filter layer of liquid crystal display device and method for fabricating liquid crystal display device using the same

Disclosed is an electrophoretic display (EPD) device and fabrication method thereof that has a simplified fabrication process and reduced fabrication costs. In the EPD device, a partition wall is formed directly on a first substrate having a pixel electrode and extended up a lateral surface of the partition wall to prevent dead areas in the pixel region, provide increased aperture ratio, and enhanced image quality.

Electrophoretic display device and method of fabrication thereof

Disclosed is an electrophoretic display device and a fabrication method thereof, and the electrophoretic display device may include a thin-film transistor formed on a lower substrate, a pixel electrode connected to the thin-film transistor, side electrodes formed at periphery of the pixel electrode, a partition wall formed on the side electrode, fluid including an electrophoretic particles formed between the partition walls, and an upper substrate adhered on the lower substrate and formed with a common electrode on the rear surface thereof.

Electrophoretic display device and method for fabricating the same

An electrophoretic display device in which a barrier defining a unit pixel is directly formed on a first substrate and the unit pixel is filled with an electrophoretic material, and a fabrication method thereof are provided. A barrier surrounding a display area is formed on a non-display area and a sealant is filled between the barrier and a partition wall to facilitate an attachment of first and second substrates.

Electrophoretic display device and fabrication method thereof

A method of fabricating an array substrate for an in-plane switching (IPS)-mode liquid crystal display (LCD) device, which includes a common electrode and a pixel electrode with a fine line width, are provided. The formation of the pixel electrode and the common electrode of the array substrate includes depositing two different metal layers and patterning the two different metal layers using a selective etching process. Thus, the pixel electrode and a central common electrode may be formed to have a fine line width so that the IPS-mode LCD device can have an improved aperture ratio.

Method of fabricating array substrate for in-plane switching mode liquid crystal display device

An array substrate having double-layered metal patterns for use in a liquid crystal display device and a manufacturing method thereof are disclosed in the present invention. The array substrate includes a gate electrode and a gate line each having a molybdenum alloy (Mo-alloy) layer and a copper (Cu) layer configured sequentially on a substrate; a gate insulation layer on the substrate to cover the gate electrode and the gate line; an active layer arranged on the gate insulation layer in a portion over the gate electrode; an ohmic contact layer on the active layer; a data line on the gate insulation layer, the data line crossing the gate line and defining a pixel region; source and drain electrodes on the ohmic contact layer, the source electrode extending from the data line, and the drain electrode spaced apart from the source electrode; a passivation layer on the gate insulation layer covering the data line and the source and drain electrode, the passivation layer having a drain contact hole exposing a portion of the drain electrode; and a pixel electrode configured on the passivation layer in the pixel region, the pixel electrode electrically contacting the drain electrode through the drain contact hole.

Method of fabricating array substrate having double-layered patterns

A method of fabricating an electrophoretic display device includes forming a gate electrode, a gate line, a data line and a thin film transistor on a substrate having a display region, a non-display region at a periphery of the display region and a cut portion at an outer region of the non-display region; forming a passivation layer over the thin film transistor; forming a pixel electrode connected to the thin film transistor; forming an align mark in the cut portion; attaching an electrophoresis film onto the pixel electrode; forming a color filter layer on the base film using the align mark; wherein the step of forming the align mark is simultaneously performed with one of the step of forming the gate line, the step of forming the data line, and the step of forming the pixel electrode.

An array substrate of an in-plane switching liquid crystal display device includes, among other features, a gate electrode and a gate line having a first double-layered structure consisting of a first barrier layer and a first low resistance metallic layer; a data line defining a pixel region with the gate line, the data line having a second double-layered structure consisting of a second barrier layer and a second low resistance metallic layer; a plurality of common electrodes disposed in a direction opposite to an adjacent gate line; a thin film transistor (TFT) near a crossing of the gate and data lines, each of the source and drain electrodes of the TFT having the same double-layered structure as the data line; and a plurality of pixel electrodes arranged in an alternating pattern with the common electrodes and disposed in the direction opposite the adjacent gate line.

Array substrate for in-plane switching mode liquid crystal display device having double-layered metal patterns and method of fabricating the same

According to an embodiment of the present invention, a method for manufacturing a color electrophoretic display device includes forming a thin film transistor (TFT) array substrate including a display region, wherein a plurality of pixel regions is defined in a matrix, and alignment keys are provided at the outside of the display region, forming an electrophoretic layer including a micro capsule layer formed so as to correspond to the display region of the TFT array substrate, and forming a color filter layer on an outer surface of the electrophoretic layer using the alignment keys so as to correspond to the respective pixel regions of the display region.

Color electrophoretic display device and method for manufacturing the same

A manufacturing method of an electro line for a liquid crystal display device includes depositing a barrier layer made of a conducting material on a substrate, depositing a copper layer (Cu) on the barrier layer, wet-etching the Cu layer using a first etchant, and dry-etching the barrier layer using a second etchant using the wet-etched Cu layer as an etch mask.

Manufacturing method of electro line for liquid crystal display device

Method of fabricating array substrate for in-plane switching mode liquid crystal display device having double-layered metal patterns

Discussed are a color electrophoretic display device with a color filter layer, which is formed in a droplet state on a rear surface of an electronic ink film through surface treatment so as to be capable of adjusting density of droplets in pixels and achieving correct alignment, and a method for manufacturing the same. The method includes forming a thin film transistor (TFT) array substrate including a display region, in which a plurality of pixel regions are defined in a matrix, and alignment keys provided at the outside of the display region, forming an electrophoretic layer including a micro capsule layer formed so as to correspond to the display region of the TFT array substrate, and forming a color filter layer on the electrophoretic layer using the alignment keys so as to correspond to the respective pixel regions of the display region.

Growing community of inventors

Gyeonggi-do, South Korea

Oh-Nam Kwon