Robert Boschgmbh

Odd-Axel Pruetz

Reinhard Neul

Burkhard Kuhlmann

Matthias Kuehnel

Peter Degenfeld-Schonburg

Nils Felix Kuhlmann

Niels Bode

Jan-Timo Liewald

Andreas Lassl

Mirko Hattass

Rolf Scheben

Torsten Ohms

Friedjof Heuck

Benjamin Schmidt

Robert Maul

Christian Hoeppner

Andreas Lassi

Jochen Reinmuth

Joerg Muchow

Helmut Grutzeck

Frederic Njikam Njimonzie

Hendrik Specht

Stefan Zehringer

Massimiliano Putignano

A micromechanical rate-of-rotation sensor set-up, including a first rate-of-rotation sensor device capable of being driven rotationally by a driving device via a drive frame device, so as to oscillate about a first axis, and is for measuring a first outer rate of rotation about a second axis and a second outer rate of rotation about a third axis; and a second rate-of-rotation sensor device capable of being driven by the driving device via the drive frame device, so as to oscillate linearly along the second axis, and is for measuring a third outer rate of rotation about the first axis. The first rate-of-rotation sensor device is connected to the second rate-of-rotation sensor device by the drive frame device. The drive frame device includes a first and second drive frame, which may be driven by the driving device in phase opposition, along the third axis, in an oscillatory manner.

Micromechanical rate-of-rotation sensor set-up, rate-of-rotation sensor array and corresponding manufacturing method

A rotation-rate sensor having a substrate, the substrate having a main-extension-plane, and the rotation-rate sensor includes at least one first and one second mass-element which are oscillate-able, and a first main-extension-direction of the substrate points from the first mass-element to the second mass-element, and a coupling-structure is situated in the first main-extension-direction between the first and second mass-element, in which a first coupling-region of the coupling-structure is situated in a first function-layer, and a first mass-region of the first mass-element is situated in the first function-layer and a second mass-region of the first mass-element is situated in a second function-layer, the first function-layer being situated in an extension-direction perpendicular to the main-extension-plane between the substrate and the second function-layer, a second main-extension-direction being situated perpendicular to the first main-extension-direction, and the first coupling-region having a greater extension in the first main-extension-direction than in the second main-extension-direction.

Rotation-rate sensor, method for producing a rotation-rate sensor

A micromechanical rotation rate sensor system and a corresponding manufacturing method are described. The micromechanical rotation rate sensor system includes a first rotation rate sensor unit drivable rotatorily about a first axis in an oscillating manner for detecting a first outside rotation rate about a second axis and a second outside rotation rate about a third axis, the first, second and third axes being situated perpendicularly to one another, and a second rotation rate sensor unit linearly drivable by a drive unit along the second axis in an oscillating manner for detecting a third outside rotation rate about the first axis. The second rotation rate sensor unit is connected to the first rotation rate sensor unit via a first coupling unit for driving the first rotation rate sensor unit by the drive unit.

Three-axis micromechanical rotation rate sensor system including linearly and rotatorily drivable sensor units

A microelectromechanical inertial sensor to measure a rate of rotation and/or acceleration, the inertial sensor having a substrate, at least two deflectable masses coupled mechanically to the substrate, and at least one detector detecting movements of the masses along a first direction, the masses being mechanically coupled to one another by at least one first, second, and third coupling element, the coupling elements being configured so that when there is a deflection of the masses from the rest position a pivoting of a first main direction of extension of the first coupling element relative to a second main direction of extension of the second coupling element takes place and a pivoting of the second main direction of extension relative to the third main direction of extension of the third coupling element takes place, and the coupling elements being coupled mechanically to the substrate via at least one substrate connecting point.

Inertial sensor for measuring a rate of rotation and/or acceleration

A micromechanical rotational rate sensor system includes a first rotational rate sensor device that can be driven rotationally about a first axis in oscillating fashion for acquiring a first external rate of rotation about a second axis and a second external rate of rotation about a third axis, the first, second, and third axes being perpendicular to one another; and a second rotational rate sensor device, capable of being driven in linearly oscillating fashion along the second axis, for acquiring a third external rate of rotation about the first axis. The first rotational rate sensor device is connected to the second rotational rate sensor device via a drive frame device. The drive frame device has a first drive frame and a second drive frame that are capable of being driven in oscillating fashion by the drive device with opposite phase along the third axis.

Micromechanical rotational rate sensor system and corresponding production method

A micromechanical rate-of-rotation sensor includes a first Coriolis element. The micromechanical rate-of-rotation sensor further includes a first drive beam arranged along the first Coriolis element. The first drive beam is coupled via a first spring to the first Coriolis element. The micromechanical rate-of-rotation sensor further includes a first drive electrode carrier extending from the first drive beam in a direction opposite to the first Coriolis element. The first drive electrode carrier is configured to carry a multiplicity of first drive electrodes extending parallel to the first drive beam.

Micromechanical yaw rate sensor and method for operating same

A micromechanical yaw rate sensor includes a substrate and a rotationally oscillating mass having a rotationally oscillating mass bearing. The rotationally oscillating mass bearing includes a rocker bar, a rocker spring rod which resiliently connects the rocker bar to the substrate, and two support spring rods which resiliently connect, on opposite sides of the rocker spring rod, the rocker bar to the rotationally oscillating mass.

Micromechanical yaw rate sensor and method for the production thereof

A micromechanical device and a corresponding manufacturing method. The micromechanical device includes: a spring element which is moveably coupleable or is moveably coupled to a frame unit at at least one connecting point of the spring element, the spring element including at least one web, which extends outward from the at least one connecting point; and the at least one web being structured in such a way that it includes at least one first section as well as at least one widening section for reducing a non-linearity of the spring element, which is widened compared to the first section.

Micromechanical spring device and method for manufacturing a micromechanical spring device

A micromechanical component is provided, the micromechanical component including a deflection device which is deflectable parallel to a deflection direction, and the micromechanical component including a damping device, a surface of the deflection device facing the damping device being greater than a sectional area of the deflection device disposed perpendicular to the deflection direction and situated in a region of the deflection device that is facing away from the damping device.

Micromechanical component

A rotation rate sensor which includes a substrate, a first structure which is movable relative to the substrate and a second structure which is movable relative to the substrate and relative to the first structure. The first structure includes at least one first drive device and the second structure includes at least one second drive device. The first and second drive devices are situated for the joint deflection of the first structure from a neutral position of the first structure in parallel to a drive direction and of the second structure from a neutral position of the second structure in parallel to the drive direction, due to an interaction between the first and second drive devices in such a way that the first and second structures are excitable into an oscillation in phase opposition, in each case with a motion component in parallel to the drive direction.

OMM rotation rate sensor including a drive, without stationary electrodes

A rotation rate sensor includes a substrate having a main extension plane and a Coriolis element, in which the rotation rate sensor is configured so that the Coriolis element is excitable with the aid of an excitation arrangement to carry out an excitation oscillation along a first direction and in parallel to the main extension plane, the rotation rate sensor including a compensation element for exerting a compensation force, the compensation force having a non-linear dependence on the excitation oscillation.

Rotation rate sensor and method for operating a rotation rate sensor

A rotation rate sensor for detecting a rotation rate about a rotational axis parallel to a main extension plane of a substrate of the sensor includes: a first oscillating mass; and a second oscillating mass mechanically coupled to the first oscillating mass. The first oscillating mass is (i) deflectable along a first oscillations plane parallel to the main extension plane, (ii) extends in a planar manner parallel to the first oscillations plane in a rest position, and (iii) deflectable out of the first oscillations plane into a first deflection position. The second oscillating mass is (i) deflectable along a second oscillations plane parallel to the first oscillations plane, (ii) extends in a planar manner parallel to the second oscillations plane in a rest position, and (iii) deflectable out of the second oscillations plane into a second deflection position.

A yaw rate sensor is described which includes a substrate having a main plane of extension and a Coriolis element, the Coriolis element being excitable to a driving oscillation along a first direction parallel to the main plane of extension, using a driving arrangement, and a deflection of the Coriolis element along a second direction perpendicular to the first direction being detectable, and the yaw rate sensor having an interference element for exciting the Coriolis element to an interference oscillation.

Yaw rate sensor and method for operating a yaw rate sensor

A micromechanical inertial sensor having at least one seismic mass which may be deflected relative to a substrate, and at least one electrode surface which in terms of circuitry, together with at least portions of the seismic mass forms at least one capacitor having a capacitance which is dependent on the deflection of the seismic mass. At least one additional auxiliary electrode is included which is located outside the region which forms the capacitor and which may be set at a potential that deviates from the potential of the seismic mass.

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Nuertingen, Germany

Odd-Axel Pruetz