Fastar, Ltd.

Millipore Investment Holdings, Ltd.

Other

Mykrolis Corporation

Fas-technologies, Inc.

Ocie T Snodgrass

Gregory M Gibson

Michael K Farney

John E Hawes

Carl W Newquist

Samer Mahmoud Kabbani

Altaf A Poonawala

Rene Soliz

Darwin R Frerking

Zi-Qin Wang

Scott A Snodgrass

Eric E Anderson

The invention pertains to a coating apparatus and method in which most of the relative movement between a dispensing head and the substrate to be coated is provided by the coating head. The moving head configuration reduces the system footprint and diminishes leveling problems. A powered shuttle mechanism carries a dispensing head above a substrate to be coated while riding on a bearing located underneath the chuck holding the substrate thereby providing rigidity and reducing the system footprint. Chuck support is designed to accommodate anticipated vertical sag in the dispensing head by supporting the chuck at points along its periphery thereby permitting the chuck to sag in conjunction with the dispensing head. The shuttle mechanism is equipped with means for automatically adjusting the height of the dispensing head with respect to substrate to compensate for substrate placement error, substrate dimensional variation, and mechanical drift in the mechanical machine parts. Coating consistency is enhanced using such height adjustment. A part of the apparatus containing the fluid delivery equipment and in communication with the dispensing head may be placed on a cart and removably attached to the rest of the apparatus. There is a utility station comprising equipment for cleaning and priming the dispensing head which may be located on the removable cart. A pump in addition to main remote pumping means may be integrally mounted on the dispensing head to more precisely control fluid flow to the dispensing head. The chuck may be configured to be micro deformable so as to maintain the surface of a substrate upon it at a constant height. Fluid may be dispensed along openings of selected lengths along the length of the dispensing head using die lips attached to the dispensing head or by cutting a plurality of slots in a single dispensing head.

Moving head, coating apparatus

The present invention relates to a system and method suitable for automatic cleaning of a coating or extrusion head of a coating apparatus. The invention includes a scrubbing station wherein a combination of physical contact and strong solvent solution combine to remove coating fluid from the exterior of an extrusion head. A second cleaning station, preferably a rinsing station then further cleans the head of coating fluid and removes solvent used at a first cleaning station. The solvent used at the rinsing station is preferably self-drying thereby obviating the need for any further cleaning action. The invention also provides for the ability to prime the coating bead at the extrusion head so as to have a fully formed bead ready before the head begins coating a substrate, thereby providing an even coating across said substrate. The priming operation preferably comprises holding the head steady over a rotating priming roller while extruding fluid preferably at a constant volumetric flow rate. The extrusion head is removed from the priming station when the coating bead is properly formed, and the extruded coating material is dissolved in a solvent bath at the priming station. The priming operation may also be performed at either of the cleaning stations.

System and method for cleaning and priming an extrusion head

Moving head coating apparatus and method

Extrusion coating of circular and other substrates is taught with a linear extrusion head in a linear motion utilizing a chuck assembly providing a coating bead forming surface. The coating bead forming surface allows for the coating bead to be at a steady state at all points at which the extrusion head interfaces with the substrate during the linear motion. Various configurations of chuck assemblies are taught to allow for improved handling of the substrate, deploying of the chucks in existing machinery, and simplified cleaning of the coating bead forming surface. Additionally, adaptation of the chuck assembly for discouraging undesired migration of the coating material is taught.

Linear extrusion coating system and method

System and method for clean and priming extrusion head

A control system for assisting in applying a uniform layer of liquid to a substrate. The control system monitors a fluid pump advantageously integrated directly with an extrusion head. The pump receives the material to be deposited from a remote reservoir and controls dispersion of fluid to the extrusion head. The pump dispense rate is controlled by hydraulic pressure selectively applied by a flow control motor. The control system ensures that a steady-state flow of the liquid is maintained while preventing transient perturbations during initial extrusion startup.

Intelligent control system for extrusion head dispensement

A fluid dispensing system is provided which has a first diaphragm pump, a filter connected to receive the discharge of said first pump, and an accumulator/second diaphragm pump connected to receive the discharge of said filter. Hydraulic fluids pumped by cylinder/piston/stepper assemblies independently actuate each of the diaphragm pumps, providing accurate, controllable and repeatable dispense of the subject fluid. There is also structure operable to suck back fluid from downstream of the second pump.

Fluid dispensing system

A fluid dispensing system is provided which has a first diaphragm pump, a filter connected to receive the discharge of said first pump, and an accumulator/second diaphragm pump connected to receive the discharge of said filter. Hydraulic fluids pumped by cylinder/piston/stepper assemblies independently actuate each of the diaphragm pumps, providing accurate, controllable and repeatable dispense of the subject fluid. The system further includes a suck-back device downstream of the second pump.

Fluid dispensing system having independently operated pumps

A gas driven pump controls the process fluid pressure within a filtering and dispensing system. A pressure controller in the pump controls gas pressure within an enclosed chamber in the pump. The gas chamber is adjacent a floating piston that rests atop a layer of incompressible fluid in a fluid chamber. The incompressible fluid connects to a diaphragm head. As the gas pressure is increased, the floating piston will transmit that pressure through the incompressible fluid that then forces a relative displacement in the process fluid flow. A feedback system used in conjunction with the gas driven pump controls the gas pressure in order to regulate the process fluid flow. In addition, a positive displacement compensator can be used in conjunction with the gas driven pump in order to further regulate the process flow.

Gas driven pump for the dispensing and filtering of process fluid

A fluid dispensing system is provided which has a first diaphragm pump, a filter connected to receive the discharge of said first pump, and a accumulator/second diaphragm pump connected to receive the discharge of said filter. Hydraulic fluids pumped by cylinder/piston/stepper assemblies independently actuate each of the diaphragm pumps, providing accurate, controllable and repeatable dispense of the subject fluid.

The inventive dispenser mechanism uniformly develops a photosensitive layer on a substrate. The mechanism uses a developer head that moves in a substantially linear relative motion with respect to the substrate and dispenses a developer at a controlled rate. Contact of the developer material with the photosensitive layer commences a chemical reaction of developing. The mechanism also uses a rinse head that has the same motion as the developer head and travels at the same velocity. The rinse head dispenses a rinse material at a controlled rate. Contact of the rinse material with the developer material on the photosensitive layer retards the chemical reaction of developing. The rinse head waits for a predetermined dwell period after the developer head has dispensed the developer material before dispensing the rinse material. The mechanism may also use a suction head that has the same motion and velocity and removes loose material on a surface of the substrate.

Linear developer

A fluid dispensing system is provided which has first diaphragm pump means, a filter connected to receive the discharge of said first pump, and accumulator/second diaphragm pump means connected to receive the discharge of said filter. Hydraulic fluids pumped by cylinder/piston/stepper assemblies independently actuate each of the diaphragm pumps, providing accurate, controllable and repeatable dispense of the subject fluid.

A fluid dispensing system is provided which has first diaphragm pump means, a filter connected to receive the discharge of the first pump, and second diaphragm pump means connected to the receive the discharge of said filter. Hydraulic fluids pumped by cylinder/piston/stepper assemblies independently actuate each of the diaphragm pumps, providing accurate, controllable and repeatable dispense of the subject fluid. In addition, pressure sensing means are provided to indicate the pressure of the actuating hydraulic fluids, and computer controller means may be utilized to monitor, adjust and control the rates and intervals of filtering and dispense of the system in response to said pressure sensing means or otherwise.

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Garland, TX, United States of America

Ocie T Snodgrass